| Deposition Sources | Steered Cathodic Arc + MF Sputtering Cathode |
|---|---|
| Technique | PVD, Balanced/Unbalanced Magentron Sputtering Cathode |
| PVD Plating Properties | High Wear Resistance, High Hardness At High Operating Temperatures, High Oxidation Resistance Low Friction Anti-sticking Scratch Resistant, Brilliant Finish In Specified Colors |
| Equipment Feature | Reliable, Flexible, Stable, Robust Design, High Yield, Fast Cycle Time, Large Batch Capacity |
| Factory Location | Shanghai City, China |
| Deposition Sources | Cathodic Arc Sources, DC/MF Magnetron Sputtering Cathodes |
|---|---|
| Gold PVD Plating | Au Gold Nano-structure Thin Film Deposition, Gold Thin Film Magnetron Sputtering, PVD Gold Sputtering, Gold Vacuum Metallizing System |
| Equipment Size | Dia: 800* 800mm Height |
| Applied Industries | Laboratory Of Universities, R&D Department Of Metal Materials Manufactures, |
| Factory Location | Shanghai City, China |
| Chamber | Vertical Orientation, 2-doors |
|---|---|
| Material | Stainless Steel 304/316 |
| Deposition Sources | DC Sputtering Cathode |
| Technique | PVD, Balanced/Unbalanced Magentron Sputtering Cathode |
| Applications | Decorations Of Jewelry, Watch, Conductive Film Coating, Metal Film, Electronics, Fuel Cell, Physics Energy, Auto Industries |
| Sputtering Targets | Carbon, Copper, Aluminum, ITO, Ti, Cr, Stainless Steel Etc |
|---|---|
| Technology | DC/MF Magnetron Sputtering Cathode |
| Pre-cleaning | Linear Anode Ion Source Plasma Pre-treatment |
| Factory Location | Shanghai City, China |
| Factory Location | Shanghai City, China |
| Technology | DC/MF Magnetron Sputtering Cathode |
|---|---|
| Pre-cleaning | Linear Anode Ion Source Plasma Pre-treatment |
| Sputtering Cathodes | MF 4 Sets; DC 2 Sets |
| Sputtering Targets | Carbon, Copper, Aluminum, ITO, Ti, Cr, Stainless Steel Etc. |
| Factory Location | Shanghai City, China |
| Magnetron Sputtering Cathode | Planar Or Cylinder Cathodes |
|---|---|
| Power Model | DC, MF |
| Deposition Sources | Cathodic Arc, Magnetron Sputters |
| Plasma Cleaning | Pulsed Bias Plasma Bombardment |
| Ion Source | Linear Anode Layer Type |
| Chamber | Vertical Orientation, 2-doors |
|---|---|
| Technology | DC Magnetron Sputtering Vacuum Coating |
| Deposition Films | Al, Cu, Ag, Au, Ti, Zr, Cr Etc. |
| Applications | Car Hub, Automotive Wheels, Chrome PVD Plating |
| Film Features | Wear Resistance, Strong Adhesion, Decorative Coating Colors |
| Deposition Films | Ni, Cu, Ag, Au, Ti, Zr, Cr Etc. |
|---|---|
| Applications | Al2O3, AlN Ceramic Circuit Boards, Al2O3 Plates On LED, Semiconductor |
| Film Features | Better Thermal Conductivity, Strong Adhesion, High Density, Low Production Cost |
| Factory Location | Shanghai City, China |
| Factory Location | Shanghai City, China |
| Sputtering Model | Unbalanced/balanced With DC, MF, RF |
|---|---|
| Sputtering Sources | Planar Sputter Or Cylinder Sputter |
| Sputtering Targets | Chromium, Copper, Aluminum, Nickel, Silver, Gold, Stainless Steel |
| Applications | Car Wheel Rims, Car Mirrors, Silver And Gold Sputtering Deposition, Medical Instrument |
| Factory Location | Shanghai City, China |
| Chamber | Vertical Orientation, 1-DOOR |
|---|---|
| Material | Stainless Steel 304/316 |
| Film Features | High Reflective, Excellent Corrosion And Wear Resistance |
| Name | Chrome Plating Machine |
| Factory Location | Shanghai City, China |
