Send Message

High Vacuum Metallizing Thin Film Deposition Equipment, MF and DC Magnetron Sputtering Deposition System

1
MOQ
Negotiable
Price
High Vacuum Metallizing Thin Film Deposition Equipment,  MF and DC  Magnetron Sputtering Deposition System
Features Gallery Product Description Request A Quote
Features
Specifications
Technology: MF Mid-frequency Magnetron Sputtering
Pre-cleaning: Linear Anode Ion Source Plasma Pre-treatment
MF Sputtering Cathodes: 2 Sets
Chamber Configuration: Vertical And Cylindrical Chamber, Front Opening Door
Factory Location: Shanghai City, China
Worldwide Service: Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America
Training Service: Machine Operation, Maintenance, Coating Process Recipes, Program
Training Service: Machine Operation, Maintenance, Coating Process Recipes, Program
Warranty: Limited Warranty 1 Year For Free, Whole Life For Machine
OEM & ODM: Available, We Support Tailor Made Design And Fabrication
OEM & ODM: Available, We Support Tailor Made Design And Fabrication
High Light:

small pvd coating machine

,

vacuum coating plant

Basic Infomation
Place of Origin: Made in China, Shanghai
Brand Name: ROYAL
Certification: CE, UL Standard
Model Number: RTSP1215
Payment & Shipping Terms
Packaging Details: 1*40HQ
Delivery Time: 16 weeks
Product Description

 

 

High Vacuum Metallizing Equipment Manufacturer , Thin Film Deposition Equipment , MF Sputtering System

 

        Royal Technology designed and built the high vacuum sputter deposition systems for various industrial applications: RT1215-SP sputtering vacuum metalizer contains: DC and RF sputtering cathodes. The sputter metalization machine can deposit solid targets like: Chromium, Aluminum, Titanium, Silver, Gold, Stainless Steel, Copper, Stainless Steel on Glass, Ceramic, Metal and alloy, steel, plastic substrates.

 

The vacuum sputtering coating machine is installed with 2 pairs of MF sputtering cathodes on chamber, and 1 set of Anode Layer Ion source for plasma bombardment cleaning before PVD film deposition and 2 sets DC Sputtering cathodes. 

 

Royal technology optimized the planar sputtering cathode sources which highly improve the target ultilization rate up to 40%, the closed magnetic field which ensure the deposition films are highly smooth, high dense and strong adhesion properties. 

 

High Vacuum Metallizing Thin Film Deposition Equipment,  MF and DC  Magnetron Sputtering Deposition System 0

 

 

RTSP1215-3D design illustration

 

High Vacuum Metallizing Thin Film Deposition Equipment,  MF and DC  Magnetron Sputtering Deposition System 1

 

High Vacuum Metallizing Thin Film Deposition Equipment,  MF and DC  Magnetron Sputtering Deposition System 2

 

 

High Vacuum Metallizing Equipment Features:

 

1. Robust design, good for limited room space

2. Easy access for maintenance and repair

3. Fast pumping system for high yield

4. CE standard electrical enclosure, UL standard is also available.

5. Accurate fabrication workmanship

6. Stable running to guarantee high quality film production.

 

The key feature is that Royal's customized operation and control program and software, which is available to meet various requests from customer's demands. The control system is PLC + Touch screen:

 

PLC remote monitoring and control ( Local Area Network )

1) Remote control Team View Program

2) PLC program back up + HMI program back up

3) PC operating environment
System:Window 2000/Window XP/Window 7
Display Pixel:1920*1080

 


 

Learn more about the machine and applications available, please contact us now.

Recommended Products
Get in touch with us
Fax : 86-21-67740022
Characters Remaining(20/3000)