Zinc alloy door handle Magnetron Sputtering Vacuum Coating Units: DC, MF, RF sputtering cathodes for R&D purpose can get monolayer, dielectric film, compound film, semiconductor, multiple layers, composite film, and dielectric films etc
Zinc alloy door handle Magnetron Sputtering Vacuum Coating Units Technical Performance:
1 Ultimate Vacuum Pressure: better than 5.0×10-6 Torr.
2. Operating Vacuum Pressure: 1.0×10-4 Torr.
3. Pumpingdown Time: from 1 atm to 1.0×10-4 Torr≤ 3 minutes ( room temperature, dry, clean and empty chamber)
4. Metalizing material (sputtering ) Al, Cr, Sn, Ti, SS, Cu… etc.
5. Operating Model: Full Automatically /Semi-Auto/ Manually
Zinc alloy door handle Magnetron Sputtering Vacuum Coating Units Structure
1. Vacuum Chamber
2. Rouhging Vacuum Pumping System (Backing Pump Package)
3. High Vacuum Pumping System (Diffusion Pump)
4. Electrical Control and Operation System
5. Auxiliarry Facility System (Sub System)
6. Deposition System
