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High Yield Tantalum PVD Sputtering Coating Machine DC Magnetron Sputtering

China High Yield Tantalum PVD Sputtering Coating Machine DC Magnetron Sputtering supplier

Large Image :  High Yield Tantalum PVD Sputtering Coating Machine DC Magnetron Sputtering

Product Details:

Place of Origin: China
Brand Name: ROYAL
Certification: CE
Model Number: RTAS

Payment & Shipping Terms:

Minimum Order Quantity: 1 set
Packaging Details: Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.
Delivery Time: 14~16weeks
Supply Ability: 10 sets per month
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Detailed Product Description
Technology: Arc Ion Plating + PVD Sputtering Deposition Targets: TiAl, Ta, Ni, Cr, Ti, Au, Ag, SS, Cu, Zr, Al Etc.
Properties: High Yield, High Uniformity, High Target Utilization Application: Multiple Layer Films Deposition
Advantages: Environmentally Friendly Operating Process

                 Tantalum PVD Sputtering Coating Machine, Tantalum films deposited by DC Magnetron Sputtering, PVD Tantalum Plating


Tantalum is most widely used in the electronic industry and as a protective coating in many industries because of its good resistance to erosion.


Sputtered tantalum films are widely used in the
1.  Microelectronics industry as the films can be reactively sputtered and thus resistivity and temperature coefficient of resistance can be controlled;

2. Medical instruments like body implants for its highly biocompatability property; 

3. Coatings on corrosion resistant parts, such as thermowells, valve bodies, and fasteners;



Sputtered tantalum can be also be used as an effective corrosion resistance barrier if the coating is continuous, defectected  and is adherent to the substrate is intended to protect


Royal Technology designed and built 2 models PVD magnetron sputtering system for customers exclusively application.


RTAS1200  and RTAS1000 models. 


Ta Sputtering deposition machine design features:


 Robust Design, Stable Quality, Fast Cycle,  Fast Cycle Time, High deposition speed


Main Configurations
TECHNOLOGY DC magnetron sputtering + Cathodic arc plating
CHAMBER MATERIAL Stainless Steel (S304)
CHAMBER SIZE Φ1000*1600mm (H)
CHAMBER TYPE D shape, cylindrical chamber
ROTATION RACK & JIG SYSTEM Satellite driving or central driving system
POWER SUPPLIES DC Sputtering Power Supply: 2~4 sets Bias Power supply: 1 set Arc Power supply: 11 sets

Planar Sputtering Cathodes + circular arc cathodes

Remark: cylinderial DC sputter is avaliable

CONTROL PLC(Programmable Logic Controller) + Touch Screen ( manual+ auto+ semi-auto operation models)
PUMP SYSTEM Rotary Vane Pump: SV300B - 1 set (Leybold)
Roots Pump: WAU1001 - 1 set (Leybold)
Holding Pump: D60C - 1 set (Leybold)
Magnetic Suspension Molecular Pump: MAG2200 - 2 sest (Leybold)
GAS MASS FLOW CONTROLLER 4 channels, Made in China, Seven Star (CS series, ) digital model (Ar, N2, O2, C2H2)
VACUUM GAUGE Model: ZDF-X-LE, Made in China
SAFETY SYSTEM Numerous safety interlocks to protect operators and equipmen
HEATING Heaters: 20KW. Max. temp.: 450℃
COOLING Industrial Chiller (Cold Water)
POWER MAX. 100KW (Approx.)
FOOT PRINT ( L*W*H) 4000*4000 *3600 MM
POWER ELECTRICAL AC 380V/3 phases/50HZ / 5 line


Cylindrical sputtering cathodes                                   Planar sputtering cathodes 


High Yield Tantalum PVD Sputtering Coating Machine DC Magnetron Sputtering     High Yield Tantalum PVD Sputtering Coating Machine DC Magnetron Sputtering




Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.

Contact Details

Contact Person: Ms. Zhou

Tel: +8615316373076

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