RTAC-SPMF sesries machines deposition sources are: steered arc cathodes; MF sputtering cathodes with balanced/unblanced magnetic closed filed; Ion source device as an important device to generate plasma filed which highly enchance the film adhesion. We have developed exclusively Ion source unit or use Gencoa company's product.
PVD Coating Equipment:
1. It can deposit a veriety of pure metal films and alloy films. If the vacuum chamber through a veriety of reactive gases, and can coating various compounds film. It has been applied not only on the lighter but to the construction and daily necessities decoration plating (imitation gold plated, plating a veriety of colors,....), mechanical tool coatings, anti-corrosion coatings in nuclear industry, solid lubricating coatings in the aerospace industry as well as other coatings of various funcational coatings.
2. Advantage: High deposition rate, High ionization rate, Easy operation, High productivity and Low cost. No waste gases and water.Magnetron sputtering stably at low temperature.
3. Operation Modes:
(2) Automatic bombardment
(3) Accurate control of various process time
4. Coating colors: Gold, Rose gold, Black gold, Coffee, Silver, Champagne gold, Multicolor, etc.