The PVD Direct Plating Silver on ceramic dielectric filters is an advanced coating technology applied with 5G base station and other semiconductors for electronic industries. One typical application is Ceramic Radiating Substrate. Silver / Copper conductive film deposition on Aluminum Oxide (Al2O3), AlN substrates by PVD vacuum sputtering technology, has above all one big advantage compared to traditional manufacturing methods: DBC LTCC HTCC, which has much lower production costs. Royal Technology’s team collaborated with our customer to develop the PVD Silver Plating process successfully applying with sputtering technology which can replace conventional liquid silver brushing process.
Typical Applications
Only to name a few, for more applications, please contact Royal Tech.
The RTAS1215 batch Sputtering system is the upgraded version ,the newest system has several advantages:
Higher Efficient Process
1. Double sided coating is available by turnover fixture design
2. Up to 8 standard planar cathode flanges for multiple sources
3. Large capacity up to 2.2 ㎡ ceramic chips per cycle
4. Fully Automation, PLC+Touch Screen, ONE-touch control system
Lower Production Cost
1. Equipped with 2 sets magnetic suspension molecular pumps, fast starting time, free maintenance
2. Maximum heating power
3. Octagonal shape of chamber for optimum space using, up to 8 arc sources and 4 sputtering cathodes for fast deposition of coatings
Technical Specifications
Model: RTSP-Ag1215
Chamber Height (mm): 1500
Chamber diameter (mm): φ1200
Sputtering Cathodes Mounting Flange: 4
Ion Source Mounting Flange: 1
Arc Cathodes Mounting Flange: 8
Satellites (mm): 16 x Φ150
Pulsed Bias Power (KW): 36
Sputtering Power (KW): DC36 + MF36
Arc Power(KW): 8 x 5
Ion Source Power (KW): 5
Heating Power (KW): 36
Effective Coating Height (mm): 1020
Magnetic Suspension Molecular Pump: 2 x 3300 L/S
Roots Pump: 1 x 1000m³/h
Rotary Vane Pump: 1 x 300m³/h
Holding Pump: 1 x 60m³/h
Capacity: 2.2 ㎡
Installation Area ( L x W x H) mm: 4200*6000*3500
Insite
Built Time: Since 2016
Quantity: 3 sets
Location: China
Compared with the market huge demand, batch system's productivity is low; we have been dedicated developing the In-line sputtering system ( continues sputtering deposition line) with automatically robot loading/unloading devices. Anyone who is interested in this system, please contact our technician for more specifications.
