PVD chrome -- from low to high reflections;
from light to darker chrome finishing
Magnetron Sputtering:
Process: Magnetron sputtering involves the use of low-pressure plasma and magnetic fields to generate a plasma discharge within the deposition chamber.
Target Material: The target material can be graphite or another metal target (e.g., titanium or chromium) with a carbon-containing gas introduced into the chamber.
Ionization and Deposition: The plasma discharge causes sputtering of metal ions from the target, which are then accelerated towards the watch case surface. Simultaneously, the carbon-containing gas dissociates into carbon ions, which bond with the metal ions on the surface, forming the DLC coating.
Advantages:
Allows for better control over the composition of the coating.
Can achieve good coating thickness uniformity.
Offers flexibility in using different target materials for improved coating properties.