R & D Multiple - Functions Vacuum Coating Equipment MF / DC Sputtering Cathodes
R&D Multiple-Functions Vacuum Coating Equipment
Keywords: PVD Hard Coatings, PECVD process, DLC film, Diamond Like Carbon Film, Sputtering Optical film, Gencoa Magnetron Sputtering Cathode, Ion Source, PA PVD
RTAC950-SP Design Features:
Flexibility: arc and sputter sources, linear ion source devices mounting flanges are standardized for flexible exchange
Versatility: available for deposit variety of base metals and alloys, optical coatings and hard coatings, soft coatings. Compound films and solid lubricating films on the metallic and non-metallic materials substrates
Straight forward design: 2-door structure, front and back opening for easy maintenance.
1. Ultimate Vacuum Pressure: better than 8.0*10-4 Pa;
Base Vacuum pressure: 3.0*10-2 Pa
3. Pumping down Time: from atm to 1.0×10-3 Pa≤15 minutes ( room temperature, dry, clean and empty chamber)
4. Electrical Control and Operation System- PLC+ Touch ScreenOperation System:
PLC: Mitsubishi, Model:FX-IN60MR-001 SERIES
Electronic Components: SCHNEIDER,OMRON.
Safety Protecting System: Numerous safety interlocks to protect operators and equipment ( water, current gas, temperature etc.)
Coating Processes System: Process Automation & Control. Automatically saved in memory for 3 months. Featured coating recipes data: target operation current/voltage, Mass Flow, Vacuum pressure, temperature, coating times are saved for an analysis to enhance the coatings quality.
4.1 Main circuit: None-fuse breaker switch, electromagnetic switch, C/T in series type
4.2 Power Supply: MF sputtering power + DC Arc power + Bias Power Supply
4.3 Deposition control system
4.4 Operation System: Touch Screen + PLC, recipe control and data logging, Auto shutdown, auto evacuation, auto coating
4.5 Measuring System
Vacuum Pressure : Vacuum Gauge: Pirani + Penning gauge + Full range vacuum gauge -- Europe brand
Temperature measuring device: Thermocouple
MFC: Mass Flow Controller ( 4 ways ),
4.6 Alarm System: Compressed air pressure , Cooling water flow, Mis-operation
4.7 Power Load Indicator: Voltage indicator and load current indicator
5. Deposition System
5.1 Deposition source: Sputtering cathodes+ Arc sources + Ion Source
5.2 Deposition material: ITO, Titanium, Chrome, Aluminum, Stainless Steel, TiAl etc.
6.1 Air Compressed Valve Control System
6.2 Cooling Water System:Water flow pipe and switch valve system