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|Chamber:||Vertical Orientation, 2-doors||Deposition Sources:||Balance/Unbalanced Closed Magnetic Filed|
|Technique:||PECVD, Balanced/Unbalanced Magentron Sputtering Cathode||Applications:||Automotive, Semiconductor, SiC Coating, DLC Film Deposition,|
|Film Features:||Wear Resistance, Strong Adhesion, Decorative Coating Colors|
Pecvd Thin Film Coating Machine , Hydrogen Fuel Cell Vehicles Sputtering Coating System
Hydrogen Fuel Cell Vehicles Sputtering Coating System
FCV is the short name of Fuel Cell Vehicles, it is with the newest technology for next generation of green cars. It is different from the primary battery such as dry cell and rechargeable battery that needs to repeat charging, and 100% environmentally friendly.
The core technology is how to generate the electrical energy with fuel cell power module through electrochemical reaction between hydrogen as fuel and oxygen. Scientists, engineers, professors from transportation organizations and worldwide vehicles manufactures have made thousands tests and finally developed the proper processing.
Royal Technology has been working closely with customers in the past 3 years and successfully designed and fabricated the high efficiency, commercialized and standardized sputtering deposition system. We believe this technology will absolutely disruptive change the vehicles industry.
The RTSP1213 machine is a batch model sputtering system, can deposits various hard coatings, soft coatings, compound films and solid lubricating films on the metallic and non-metallic materials substrates. Applied to industries of Hydrogen Fuel Cell vehicles, photonics products, aerospace and other new energy industries.
To improve the conductivity of surface;
High corrosion resistance;
High wear resistance;
Hydrophobic composition film and other functional films
Available for compound coatings: metallic and non-metallic films.
Film thickness range from 100nm to 12μm, thickness tolerance ±5%
Low tempering parts surface hardening treatment.
Vertical orientation, polyhedron structure, 2-doors (front and back )
1. Ultimate Vacuum Pressure: better than 8.0*10-5 Pa;
3. Pumping down Time: from atm to 1.0×10-3 Pa≤15 minutes ( room temperature, dry, clean and empty chamber)
4. Deposition source: balanced/unbalanced sputtering cathodes
5. Operating Model: Full Automatically /Semi-Auto/ Manually
6. Heating: from room temperature up to max. 450℃,
7. Plasma cleaning and Plasma assist deposition: Anode Linear Ion Source
8. Magnetic Closed - Loop filed. (Unbalance/balance cathodes)
9. Bias Power supply for glow discharging.
The vacuum coating machine contains key completed system listed below:
1. Vacuum Chamber
1.1 Size: Inner Diameter 1200mm
Inner Height: 1300mm
1.2 Material: Vacuum Chamber SUS304
Door and flanges SUS304
Chamber strengthen structure: SS41 mild steel, with painted finishing surface treatment.
Chamber chassis SS41 mild steel with painted finishing surface treatment.
1.3 Sputtering Shield : SUS304
1.4 View Window: on chamber door - 4 sets ( 2 on each door)
1.5 Vacuum Chamber Venting Valve (including silencer)
1.6 Door: SUS304 material
2. Roughing Vacuum Pumping System:
Oil rotary vane vacuum pump +Roots pump + Holding Pump ( Leybold)
3. High Vacuum Pumping System:
Magnetic Suspension Molecular Pump ( Leybold )
4. Electrical Control and Operation System- PLC+ Touch Screen
4.1 Main circuit: None-fuse breaker switch, electromagnetic switch, C/T in series type
4.2 Sputtering Power Supply + Ion source power supply + Bias Power Supply ( Advanced Energy )
4.3 Sputtering deposition control system
4.4 Operation System: Touch Screen + PLC, recipe control and data logging, Auto shutdown, auto evacuation, auto coating
4.5 Measuring System
Vacuum Pressure : Vacuum Gauge: Pirani + Penning gauge + Full range vacuum gauge -- Europe brand
Temperature measuring device: Thermocouple
MFC: Mass Flow Controller ( 4 ways), digital display mode-- Europe brand
4.6 Alarm System: Compressed air pressure , Cooling water flow, Mis-operation
4.7 Power Load Indicator: Voltage indicator and load current indicator
5. Deposition System
5.1 Deposition source: Sputtering cathodes, Ion source -- Europe brand
5.2 Deposition material: Carbon target
6.1 Air Compressed Valve Control System
6.2 Cooling Water System:Water flow pipe and switch valve system
Compressed Air: 5~8kg/cm2
Cooling Water: Water-In Temperature: 20~25℃, 200 Liter/min,
Water-In Pressure: 2~3 kg/cm2,
Power: 3 Phase 380V 50Hz(60Hz), 75kVA, average power consumption: 40KW
Installation Area: (L*W*H) 3000*4000*3200mm
Exhaust: Vent for mechanical pumps
Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.
Vacuum Technology: Cathodic Multi Arc plating, PVD arc deposition, Magnetron Sputtering by DC
Deposition Sources: Cylinder arc or circular arc cathodes, DC Sputter Source
Coating Films: Metal film plating, Titanium Nitride, Titanium Carbide, Zirconium Nitride, Chromium Nitride, TiAlN, CrC
Applications: watering piping and plumbings; bathroom fittings and faucets valves,