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Au Gold Magnetron Sputtering Coating Machine On Silicon Wafers , Glass Slide , Ceramic Sheets

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Au Gold Magnetron Sputtering Coating Machine On Silicon Wafers , Glass Slide , Ceramic Sheets

China Au Gold Magnetron Sputtering Coating Machine On Silicon Wafers , Glass Slide , Ceramic Sheets supplier
Au Gold Magnetron Sputtering Coating Machine On Silicon Wafers , Glass Slide , Ceramic Sheets supplier Au Gold Magnetron Sputtering Coating Machine On Silicon Wafers , Glass Slide , Ceramic Sheets supplier Au Gold Magnetron Sputtering Coating Machine On Silicon Wafers , Glass Slide , Ceramic Sheets supplier

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Product Details:

Place of Origin: Made in China
Brand Name: ROYAL
Certification: ISO, CE, UL standard
Model Number: RTAC-SP

Payment & Shipping Terms:

Minimum Order Quantity: 1 set
Price: negotiable
Packaging Details: Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.
Delivery Time: 12 weeks
Payment Terms: L/C, D/A, D/P, T/T
Supply Ability: 12 sets per month
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Detailed Product Description
Deposition Sources: Cathodic Arc Sources, DC/MF Magnetron Sputtering Cathodes Gold PVD Plating: Au Gold Nano-structure Thin Film Deposition, Gold Thin Film Magnetron Sputtering, PVD Gold Sputtering, Gold Vacuum Metallizing System
Equipment Size:: Dia: 800* 800mm Height Applied Industries: Laboratory Of Universities, R&D Department Of Metal Materials Manufactures,

 

Au Gold Magnetron Sputtering Coating Machine On Silicon Wafers , Glass Slide , Ceramic Sheets

 

 

Au Gold Magnetron Sputtering on Silicon Wafers

 

Summary:

With PVD DC sputtering technology can deposit Au Gold metal thin film on glass slides, silicon wafers. Except Au gold deposition, other metal targets also available: Silver (Ag), Copper (Cu), Aluminum (Al), Chrome (Cr), Stainless Steel (SS316L), Titanium (Ti) to obtain either conductive of functional films or high glossary of aesthetic surface on various substrate materials.

The gold sputtering layer features:

 

1. Binding layer is essential to enhance substrate and metal film adhesion. Royal Technology has developed a range of matured coating recipes based on different applications, support our customers with professional advice.

2. The roughness (RMS - root mean square) < 40Å is expected for most of the applications. For certain scanning probe applications a lower roughness might be required, generally 1.5 ~ 4 nm.

4. Gold sputtering layer surface purity: a clean surface is required for applications that employ gold surface modifications. Depending on the PVD process used, level of vacuum in the system, original purity of the gold source (over 99.99% generally)

 

Keywords: Au gold nano-structure thin film deposition, Gold thin film magnetron sputtering, PVD gold sputtering, Gold Vacuum Metallizing System

 

Applications:

 

Laboratory of Universities, R&D department of metal materials manufactures, PVD Vacuum Coating Service Centers, mostly used in electronics industry as conductive layer and the sciences for microscope specimens etc.

 

Technical Specifications:

 

MODEL RTAC0808-SP
TECHNOLOGY DC Sputtering + Ion source (for option)
MATERIAL Stainless Steel (S304)
CHAMBER SIZE Φ800*H800mm
CHAMBER TYPE Cylinder, vertical, 1-door
ROTARY RACK SYSTEM Planetary/Central driving
DEPOSITION MATERIAL Gold, Aluminum, Silver, Copper, Chrome, Stainless Steel, Nickel, Titanium
DEPOSITION SOURCE Cylindrical / Planar Sputtering Cathodes: 2 or 3 for option.+ 3 Arc sources
REACTIVE GAS CONTROL MFC, 2/4 ways
CONTROL PLC(Programmable Logic Controller) +
Touch Screen
PUMP SYSTEM SV300B - 1 set (Leybold) 300m³/hr
Roots Pump - 1 set, 150L/S
Holding Pump - 1 set, 60m³/hr
Turbo Molecular Pump: - 1 set, 3500L/S
POWER SUPPLY

Bias power supply: 1*24 KW

DC sputtering power: 2*24KW

SAFETY SYSTEM Numerous safety interlocks to protect operators
and equipment
COOLING Recycle Cooling Water
HEATING Heaters, 9KW
POWER ELECTRICAL 480V/3 phases/60HZ ( USA compliant)
460V/3 phases/50HZ ( Asia compliant)
380V/3 phases/50HZ ( EU-CE compliant)
FOOTPRINT L3200*W2600*H2000mm
TOTAL WEIGHT 3.0 T
CYCLE TIME 30~40 minutes (depending on substrate material,
substrate geometry and environmental conditions)
POWER MAX.. 50KW
AVERAGE POWER CONSUMPTION (APPROX.) 20KW

 

PVD Gold Plating wafers

 

 

Au Gold Magnetron Sputtering Coating Machine On Silicon Wafers , Glass Slide , Ceramic Sheets

Au Gold Magnetron Sputtering Coating Machine On Silicon Wafers , Glass Slide , Ceramic Sheets

 

 

Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.

Contact Details
SHANGHAI ROYAL TECHENOLOGY INC.

Contact Person: Ms. Zhou

Tel: +8615316373076

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