Labrotary DC/MF Magnetron Sputtering Deposition System , R&D Portable Thin Film Sputtering Coating System
1 set
MOQ
negotiable
Price
Labrotary DC/MF  Magnetron Sputtering Deposition System , R&D Portable Thin Film Sputtering Coating System
Features Gallery Product Description Request A Quote
Features
Basic Infomation
Place of Origin: Made in China
Brand Name: ROYAL
Certification: CE certification
Model Number: RTAS
High Light:

thin film coating equipment

,

thin film deposition equipment

Payment & Shipping Terms
Packaging Details: Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.
Delivery Time: 8 weeks
Payment Terms: L/C, T/T, D/A, D/P
Supply Ability: 10 sets per month
Specifications
Chamber: Vertical Orientation, 1-door, Front Opening
Name: Small Pvd Coating Machine
Evaporation Source: Sputtering Cathode, Sputter Gun, DC. RF. MF Models
Deposition Materials: Si,Ti, Aluminum, Gold, Silver, Chromium, Copper, Indium, Indium Tin Oxide, Nickel
Coatings: Optical Coatings, Hard Coatings, ITO, DLC Etc.
Applications: Semiconductor, Solar Cell, Fuel Cell, Scientific Organizations, Universities, Aerospace Researching System, High Energy Physics Department Etc.
Product Description

 

 

Laboratory Thin Film Magnetron Sputtering Coating Machine / Portable Thin Film Sputtering Coating System

 

 

 

Royal Technology has designed and provided various of Ultra-High-Vacuum coating systems for college teaching and scientific research and development, to study various different film growth, generates more innovative NANO thin films are applied with our commercial industries.  Our customers like: Shanghai University of China, Machanster University of UK, Beijing Scientific University, Semiconductor, Solar Cell, Fuel cell, Scientific organizations  aerospace researching and  high energy physics department etc.

 

Laboratory Thin Film Magnetron Sputtering Coating Machine : DC, MF, RF sputtering cathodes for R&D purpose can get monolayer, dielectric film, compound film, semiconductor, multiple layers, composite film, and dielectric films etc

 

Laboratory Thin Film Magnetron Sputtering Coating Machine Technical Performance:

1 Ultimate Vacuum Pressure: better than 5.0×10-6 Torr.

2. Operating Vacuum Pressure: 1.0×10-4 Torr.

3. Pumpingdown Time: from 1 atm to 1.0×10-4 Torr≤ 3 minutes ( room temperature, dry, clean and empty chamber)

4. Metalizing material (sputtering ) Al, Cr, Sn, Ti, SS, Cu… etc.

5. Operating Model: Full Automatically /Semi-Auto/ Manually

 

Laboratory Thin Film Magnetron Sputtering Coating Machine Structure

1. Vacuum Chamber

2. Rouhging Vacuum Pumping System (Backing Pump Package)

3. High Vacuum Pumping System (Diffusion Pump)

4. Electrical Control and Operation System

5. Auxiliarry Facility System (Sub System)

6. Deposition System

 

 

 

 

 

The Laboratory Thin Film Magnetron Sputtering Coating System also can combine with arc cathod and evaporation sources for more studies application. 

 

Recommended Products
Get in touch with us
Contact Person : Ms. ZHOU XIN
Fax : 86-21-67740022
Characters Remaining(20/3000)