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|Technology:||Arc Ion Plating + PVD Sputtering Deposition||Targets:||TiAl, Ta, Ni, Cr, Ti, Au, Ag, SS, Cu, Zr, Al Etc.|
|Properties:||High Yield, High Uniformity, High Target Utilization||Application:||Multiple Layer Films Deposition|
|Advantages:||Environmentally Friendly Operating Process|
Tantalum PVD Sputtering Coating Machine, Tantalum films deposited by DC Magnetron Sputtering, PVD Tantalum Plating
Tantalum is most widely used in the electronic industry and as a protective coating in many industries because of its good resistance to erosion.
Sputtered tantalum films are widely used in the
1. Microelectronics industry as the films can be reactively sputtered and thus resistivity and temperature coefficient of resistance can be controlled;
2. Medical instruments like body implants for its highly biocompatability property;
3. Coatings on corrosion resistant parts, such as thermowells, valve bodies, and fasteners;
Sputtered tantalum can be also be used as an effective corrosion resistance barrier if the coating is continuous, defectected and is adherent to the substrate is intended to protect.
Royal Technology designed and built 2 models PVD magnetron sputtering system for customers exclusively application.
RTAS1200 and RTAS1000 models.
Ta Sputtering deposition machine design features:
Robust Design, Stable Quality, Fast Cycle, Fast Cycle Time, High deposition speed
|TECHNOLOGY||DC magnetron sputtering + Cathodic arc plating|
|CHAMBER MATERIAL||Stainless Steel (S304)|
|CHAMBER SIZE||Φ1000*1600mm (H)|
|CHAMBER TYPE||D shape, cylindrical chamber|
|ROTATION RACK & JIG SYSTEM||Satellite driving or central driving system|
|POWER SUPPLIES||DC Sputtering Power Supply: 2~4 sets Bias Power supply: 1 set Arc Power supply: 11 sets|
|DEPOSITION MATERIAL||Ti/Cr/TiAl, Ta, Au, Ag, Cu etc.|
Planar Sputtering Cathodes + circular arc cathodes
Remark: cylinderial DC sputter is avaliable
|CONTROL||PLC(Programmable Logic Controller) + Touch Screen ( manual+ auto+ semi-auto operation models)|
|PUMP SYSTEM||Rotary Vane Pump: SV300B - 1 set (Leybold)|
|Roots Pump: WAU1001 - 1 set (Leybold)|
|Holding Pump: D60C - 1 set (Leybold)|
|Magnetic Suspension Molecular Pump: MAG2200 - 2 sest (Leybold)|
|GAS MASS FLOW CONTROLLER||4 channels, Made in China, Seven Star (CS series, ) digital model (Ar, N2, O2, C2H2)|
|VACUUM GAUGE||Model: ZDF-X-LE, Made in China|
|SAFETY SYSTEM||Numerous safety interlocks to protect operators and equipmen|
|HEATING||Heaters: 20KW. Max. temp.: 450℃|
|COOLING||Industrial Chiller (Cold Water)|
|POWER MAX.||100KW (Approx.)|
|AVERAGE POWER CONSUMPTION||45 KW (Approx.)|
|GROSS WEIGHT||T (Approx.)|
|FOOT PRINT||( L*W*H) 4000*4000 *3600 MM|
|POWER ELECTRICAL||AC 380V/3 phases/50HZ / 5 line|
Cylindrical sputtering cathodes Planar sputtering cathodes
Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.