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Tantalum PVD Sputtering Coating Machine DC Magnetron Sputtering

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Tantalum PVD Sputtering Coating Machine DC Magnetron Sputtering
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Features
Specifications
Technology: Arc Ion Plating + PVD Sputtering Deposition
Targets: TiAl, Ta, Ni, Cr, Ti, Au, Ag, SS, Cu, Zr, Al Etc.
Properties: High Yield, High Uniformity, High Target Utilization
Application: Multiple Layer Films Deposition
Advantages: Environmentally Friendly Operating Process
Factory Location: Shanghai City, China
Worldwide Service: Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America
Training Service: Machine Operation, Maintenance, Coating Process Recipes, Program
Training Service: Machine Operation, Maintenance, Coating Process Recipes, Program
Warranty: Limited Warranty 1 Year For Free, Whole Life For Machine
Warranty: Limited Warranty 1 Year For Free, Whole Life For Machine
Warranty: Limited Warranty 1 Year For Free, Whole Life For Machine
OEM & ODM: Available, We Support Tailor Made Design And Fabrication
OEM & ODM: Available, We Support Tailor Made Design And Fabrication
High Light:

vacuum coating plant

,

high vacuum coating machine

Basic Infomation
Place of Origin: China
Brand Name: ROYAL
Certification: CE
Model Number: RTAS
Payment & Shipping Terms
Packaging Details: Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.
Delivery Time: 14~16weeks
Supply Ability: 10 sets per month
Product Description

                 Tantalum PVD Sputtering Coating Machine, Tantalum films deposited by DC Magnetron Sputtering, PVD Tantalum Plating

 

Tantalum is most widely used in the electronic industry and as a protective coating in many industries because of its good resistance to erosion.

 

Sputtered tantalum films are widely used in the
1.  Microelectronics industry as the films can be reactively sputtered and thus resistivity and temperature coefficient of resistance can be controlled;

2. Medical instruments like body implants for its highly biocompatability property; 

3. Coatings on corrosion resistant parts, such as thermowells, valve bodies, and fasteners;

 

 

Sputtered tantalum can be also be used as an effective corrosion resistance barrier if the coating is continuous, defectected  and is adherent to the substrate is intended to protect

 

RTAS1000 Technical Advantages

 

1. Plug-in Integrated design system for quick installation

2. Siemens PLC,CPU; with Industrial PC operation & control hardware

3. Available for remote monitoring and diagnosis.
4. Flexible, ready for upgrading

5. Multiple cathodes for fast deposition speed

Tantalum PVD Sputtering Coating Machine DC Magnetron Sputtering 0

 

More benefits from the machine:

 

 Robust Design, Stable Quality, Fast Cycle,  Fast Cycle Time, High deposition speed

 

Main Configurations
MODEL RTAS1000
TECHNOLOGY DC magnetron sputtering + Cathodic arc plating
CHAMBER MATERIAL Stainless Steel (S304)
CHAMBER SIZE Φ1000*1000mm (H)
CHAMBER TYPE D shape, cylindrical chamber
ROTATION RACK & JIG SYSTEM Satellite driving or central driving system
POWER SUPPLIES DC Sputtering Power Supply: 2~4 sets Bias Power supply: 1 set Arc Power supply: 11 sets
DEPOSITION MATERIAL Ti/Cr/TiAl, Ta, Au, Ag, Cu etc.
DEPOSITION SOURCE

Planar Sputtering Cathodes + circular arc cathodes

Remark: cylinderial DC sputter is avaliable

CONTROL PLC(Programmable Logic Controller) + Touch Screen ( manual+ auto+ semi-auto operation models)
PUMP SYSTEM Rotary Vane Pump: SV300B - 1 set (Leybold)
Roots Pump: WAU1001 - 1 set (Leybold)
Holding Pump: D60C - 1 set (Leybold)
Magnetic Suspension Molecular Pump: MAG2200 - 2 sest (Leybold)
GAS MASS FLOW CONTROLLER 4 channels, Made in China, Seven Star (CS series, ) digital model (Ar, N2, O2, C2H2)
VACUUM GAUGE Model: ZDF-X-LE, Made in China
SAFETY SYSTEM Numerous safety interlocks to protect operators and equipmen
HEATING Heaters: 20KW. Max. temp.: 450℃
COOLING Industrial Chiller (Cold Water)
POWER MAX. 100KW (Approx.)
AVERAGE POWER CONSUMPTION 45 KW (Approx.)
GROSS WEIGHT T (Approx.)
FOOT PRINT ( L*W*H) 4000*4000 *3600 MM
POWER ELECTRICAL AC 380V/3 phases/50HZ / 5 line

 

 

 

Cylindrical sputtering cathodes                                   Planar sputtering cathodes 

 

Tantalum PVD Sputtering Coating Machine DC Magnetron Sputtering 1     Tantalum PVD Sputtering Coating Machine DC Magnetron Sputtering 2

 

 

 

Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.

 

Download the brochure, please click here:  Magnetron Sputtering Deposition System.pdf
                                                                          Magnetron Sputtering Deposition system applicatio...

 

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Get in touch with us
Contact Person : ZHOU XIN
Fax : 86-21-67740022
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