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| Brand Name: | ROYAL |
| Model Number: | RTSP |
| MOQ: | 1 set |
| Supply Ability: | 10 sets per month |
Tantalum PVD Sputtering Coating Machine, Tantalum films deposited by DC Magnetron Sputtering, PVD Tantalum Plating
Tantalum is most widely used in the electronic industry and as a protective coating in many industries because of its good resistance to erosion.
Sputtered tantalum films are widely used in the
1. Microelectronics industry as the films can be reactively sputtered and thus resistivity and temperature coefficient of resistance can be controlled;
2. Medical instruments like body implants for its highly biocompatability property;
3. Coatings on corrosion resistant parts, such as thermowells, valve bodies, and fasteners;
Sputtered tantalum can be also be used as an effective corrosion resistance barrier if the coating is continuous, defectected and is adherent to the substrate is intended to protect.
RTAS1000 Technical Advantages
1. Plug-in Integrated design system for quick installation
2. Siemens PLC,CPU; with Industrial PC operation & control hardware
3. Available for remote monitoring and diagnosis.
4. Flexible, ready for upgrading
5. Multiple cathodes for fast deposition speed
More benefits from the machine:
Robust Design, Stable Quality, Fast Cycle, Fast Cycle Time, High deposition speed
| Main Configurations | |
| MODEL | RTAS1000 |
| TECHNOLOGY | DC magnetron sputtering + Cathodic arc plating |
| CHAMBER MATERIAL | Stainless Steel (S304) |
| CHAMBER SIZE | Φ1000*1000mm (H) |
| CHAMBER TYPE | D shape, cylindrical chamber |
| ROTATION RACK & JIG SYSTEM | Satellite driving or central driving system |
| POWER SUPPLIES | DC Sputtering Power Supply: 2~4 sets Bias Power supply: 1 set Arc Power supply: 11 sets |
| DEPOSITION MATERIAL | Ti/Cr/TiAl, Ta, Au, Ag, Cu etc. |
| DEPOSITION SOURCE |
Planar Sputtering Cathodes + circular arc cathodes Remark: cylinderial DC sputter is avaliable |
| CONTROL | PLC(Programmable Logic Controller) + Touch Screen ( manual+ auto+ semi-auto operation models) |
| PUMP SYSTEM | Rotary Vane Pump: SV300B - 1 set (Leybold) |
| Roots Pump: WAU1001 - 1 set (Leybold) | |
| Holding Pump: D60C - 1 set (Leybold) | |
| Magnetic Suspension Molecular Pump: MAG2200 - 2 sest (Leybold) | |
| GAS MASS FLOW CONTROLLER | 4 channels, Made in China, Seven Star (CS series, ) digital model (Ar, N2, O2, C2H2) |
| VACUUM GAUGE | Model: ZDF-X-LE, Made in China |
| SAFETY SYSTEM | Numerous safety interlocks to protect operators and equipmen |
| HEATING | Heaters: 20KW. Max. temp.: 450℃ |
| COOLING | Industrial Chiller (Cold Water) |
| POWER MAX. | 100KW (Approx.) |
| AVERAGE POWER CONSUMPTION | 45 KW (Approx.) |
| GROSS WEIGHT | T (Approx.) |
| FOOT PRINT | ( L*W*H) 4000*4000 *3600 MM |
| POWER ELECTRICAL | AC 380V/3 phases/50HZ / 5 line |
Cylindrical sputtering cathodes Planar sputtering cathodes
Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.
Download the brochure, please click here: Magnetron Sputtering Deposition System.pdf
Magnetron Sputtering Deposition system applicatio...
