Metal Film Plating, Titanium Nitride, Titanium Carbide, Zirconium Nitride, Chromium Nitride, TiAlN, CrC
Ceramic And Glass House Ware Hard Coatings On Tools
magnetron sputtering machine
magnetron sputtering equipment
PVD sputtering + Ion Plating give a combination of advantages like no other can:
1. Economically efficient, generating the thinnest, most uniform coating films;
2. A dry coating process at low temperature in a vacuum chamber;
3. Offers great versatility and can be used for the deposition of conductive or non-conductive materials on any type of substrates, like: metals, ceramics, plastic materials.
4. Multi-layered coating are simple to produce. 5. Fast deposition rates and high quality surface finishes.
The planar magnetron sputtering cathodic (cylindrical sputtering cathodic) introducing, makes the coating colors is more reflective, coating surface is much more smoother, no spot and needle holes.
High quality coating products satisfy the demand of high level's pursuing.