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Unlock Next-Generation Coating Performance with the PVD Ion Plating Machine: The Multi950 Hybrid Solution

Unlock Next-Generation Coating Performance with the PVD Ion Plating Machine: The Multi950 Hybrid Solution

2025-12-28

In the evolving landscape of advanced manufacturing and materials science, the demand for high-performance, durable, and multifunctional thin films has never been greater. Researchers and developers face the constant challenge of finding equipment that offers not just precision and quality, but also unparalleled versatility and reliability for cutting-edge applications. Enter the PVD Ion Plating Machine – a cornerstone technology for achieving superior film adhesion, density, and purity. At the forefront of this innovation is the ROYAL Multi950, a hybrid PVD and PECVD vacuum deposition system engineered to transcend conventional coating limitations. This machine isn't just a tool; it's a comprehensive R&D platform born from academic collaboration and designed for the future of surface engineering.

The heart of the Multi950's capability lies in its advanced PVD Ion Plating technology.

Unlike standard PVD methods, ion plating utilizes a high-energy plasma environment where ions actively participate in the film formation process. The Multi950 integrates this powerfully through its 8 sets of arc cathodes and a dedicated Linear Ion Source. This combination ensures intense plasma ionization, leading to films with exceptional characteristics:

  • Unmatched Adhesion:

    The ion source provides robust plasma etching and ion bombardment prior to and during deposition. This cleans the substrate at an atomic level and creates a graded interface, resulting in film adhesion that withstands extreme mechanical stress and thermal cycling.

  • Superior Density & Quality:

    High-energy ions arriving at the substrate surface promote dense, void-free film growth. This yields coatings with excellent hardness, corrosion resistance, and optical properties, crucial for applications from protective hard films to precise optical filters.

  • Excellent Step Coverage:

    The ion-assisted deposition improves the throwing power, allowing for more uniform coating coverage on complex geometries, including tools with sharp edges or recessed features.

The Multi950’s "Octal Chamber" design with a 2-door structure offers unparalleled accessibility for maintenance and reconfiguration.

Its genius is standardized modularity. The arc and sputtering cathodes, along with ion source flanges, are designed for flexible exchange. This means the same core system can be effortlessly adapted between:

  • Arc-PVD Ion Plating:

    For ultra-hard, wear-resistant coatings like TiN, CrN, or DLC.

  • MF Sputtering:

    For low-stress, high-quality metallic and dielectric optical coatings.

  • PECVD Processes:

    For depositing advanced carbon-based films, such as transparent DLC, at lower temperatures, ideal for sensitive substrates.

This hybrid PVD/PECVD capability allows for the creation of novel multilayer and nanocomposite films in a single pump-down cycle, combining the best properties of different technologies.

Born from a collaboration with Shanghai University's academic team led by Professor Yigang Chen, the Multi950 is the epitome of an R&D workhorse.

It satisfies processes requiring diverse metal layers (Al, Cr, Cu, Au, Ag, Ni) and compounds on metallic or non-metallic substrates. Its proven design has spawned specialized systems for frontier applications, demonstrating its foundational versatility:

  • Hard Coatings on Cutting & Forming Tools
  • Optical Films

    for sensors and displays via magnetron sputtering.

  • Transparent DLC Films

    for wear and anti-reflective purposes.

  • Functional Films

    for sectors like aerospace, automotive, and biomedical devices.

Housed in a compact footprint (3000 x 4000 x 3200 mm), the system doesn’t compromise on power. With a total power of 150KW, it features a large φ650 x H750 mm plasma uniformity zone and a 500°C heating system with PID control for precise thermal management. Backed by a 1-year limited warranty and lifelong machine support, ROYAL TECH’s global service network extends from Europe (Poland) to Asia (India, Iran, Turkey) and the Americas (Mexico), ensuring expert onsite support, training on machine operation, maintenance, and coating process recipes.

The ROYAL Multi950 Hybrid Vacuum Deposition Machine is more than just a PVD Ion Plating Machine; it is a strategic investment in innovation. It empowers R&D departments and pilot production lines to explore new material combinations, optimize processes, and develop proprietary coatings with speed and flexibility. By integrating PVD Ion Plating, DC/MF Sputtering, and PECVD in one reliable, modular platform, it eliminates the need for multiple dedicated systems, reducing cost and accelerating time-to-market.

Ready to redefine the boundaries of your coating capabilities? Contact ROYAL TECH today to discuss how the Multi950 hybrid system can be tailored (OEM/ODM available) to meet your specific application challenges. Request a detailed consultation or a technical document to explore the future of vacuum deposition.