Low-E Film Web Coater / Web Roll to Roll Vacuum Sputtering Coating Machine
We are pleased to propose our MultiWeb-Series Roll to Roll Vacuum Sputtering Web Coater to meet your multi-layer deposition requirements.
Low-E Film Web Coater Applications: electronic paper, flexible circuits, photovoltaic, medical strips, RFID (Radio Frequency Identification) and Low-E film.
1. Substrate material: PET, PEN, PES, PI, PC, PA,... Films
2. Substrate thickness: 15~300μm
3. Deposition methods: AC Reactive for SiO2(Dielectric); Pulsed DC for ITO (Metal & Conductor)
4. Oxide conductor TCO: ITO, AZO, IZO...
5. Metal conductor: Al, Cu, Mo, Ag...
6. Optical film: Ta2O5, Nb2O5, SiO2, TiO2...
7. Semiconductor: ZnO, InGaZnO...
8. Insulator: SiO2, SiNx, AlOx, AlNx...
9. Uniformity: ±5% Across Web
The MultiWeb Coater provides the following key features:
A. One chamber divided into multi-pressure zones to accommodate various deposition sources.
B. Multi-Source simultaneous deposition capabilities in one web pass, for multi-layer coating.
C. Reversible web winding direction enables deposition of unlimited layers without breaking vacuum.
D. Precision web handling mechanisms with edge-guide to allow multiple passes without loss of alignment. (Optional)
E. AC Invert web drive system for accurate control of multiple web speeds.
F. In-line optical and/or resistance thickness monitoring systems, to control precise deposition thickness and uniformity. (Optional)
G. Chamber is constructed of SUS304L Stainless with low out gassing components to insure deeper vacuum.
H. Vacuum pumping by a combination of turbo-molecular pump and low temperature cryogenics, to provide clean vacuum without moisture or oil contamination.
|Vacum chamber body: single chamber multi-pressure zones
|Moveable carriages: Web Carriage
|Deposion Zone: 2 X Sputtering Zone (Optional: 3 Sputtering Zone)
|Sputtering Source: 2 X Dual Cathode Sputter Source (Optional: 3 Dual Cathode Sputter Source)
|Substrate Pre-treater: Linear Ion Source
|Web Width: 1300mm
|Winding Diameter: Φ600mm Max
|Winding Direction: Bi-directional
|Substrate thickness: 15~300μm
|Web Line Speed:0.5~10M/min
|Web Tension: 5.0PLI Max 0.5PLI Min
|Web Alignment: ±3mm (one pass)
|Hi-Vacuum Pump: Turbo Pump
|Rough Vacuum Pump: Dry pump & Blower combination
|Moisture Pump: Polycold Cryogenic
|Deposition Thickness Control: Monitoring (Optional)
|a: Transmit Optical; b: Eddy Current Resistance
|System Operation: PLC Based Computer System Operation