Precision Fasteners PVD Thin Film Plating Machine / Nano Thin Film PVD Decoration Finishes
What is PVD?
PVD ( is short name of Physical Vapor Deposition) is a vacuum coating process to produce a conformal metal-based thin film that can be uniformly deposited on electrically conductive surfaces. Using the Arc ion evaporation and magnetron MF sputtering method, a single coating layer provides ample coverage without modifying the surface profile. This technique is used in many electronic industries including optical media, optics and semiconductor components.
PVD Thin Film Properties
Precision Fasteners PVD Thin Film Plating Machine is applied with fasteners and fittings like screws, bolts, crushes, fittings, caps used in cosmetics, electronic products, mechanical machines, automotive industries are widely using the PVD technology to get variety of Panton colors, range of gold, black, blue, grey, silver, rainbow, bronze, champage etc.
Precision Fasteners PVD Thin Film Plating Machine Deposition Sources
Steered Circular Arc sources for evaporation of solid metal target;
2 pairs of MF unblanced sputtering cathodes for graphite thin film layer deposition;
Bias Power Supply for ion bomboardment to form the plasma area for pre-treatment;
Anode Linear Ion Source Unit ( for optional) PACVD and PECVD processing;
Cryopump ( Polycold) for water molecular condensation ( for optional)
Precision Fasteners PVD Thin Film Plating Machine Structures
1. Vacuum Chamber
2. Rouhging Vacuum Pumping System (Backing Pump Package)
3. High Vacuum Pumping System ( Magnetically Suspension Molecular Pump)
4. Electrical Control and Operation System
5. Auxiliarry Facility System (Sub System)
6. Deposition System: MF sputtering cathode, MF power supply, Bias Power Supply Ion source for optional
Precision Fasteners PVD Thin Film Plating Machin Performance
1. Ultimate Vacuum Pressure: better than 5.0×10-6 Torr.
2. Operating Vacuum Pressure: 1.0×10-4 Torr.
3. Pumpingdown Time: from 1 atm to 1.0×10-4 Torr≤ 3 minutes ( room temperature, dry, clean and empty chamber)
4. Metalizing material (sputtering + Arc evaporation): Ni, Cu, Ag, Au, Ti, Zr, Cr, TiN, TiC, TiAlN, CrN, CrC, etc.
5. Operating Model: Full Automatically /Semi-Auto/ Manually
Precision Fasteners PVD Thin Film Plating Machin Specifications
| MODEL | RTAC1250-SPMF | ||||||
| TECHNOLOGY | MF Magnetron Sputtering + Ion Plating | ||||||
| MATERIAL | Stainless Steel (S304) | ||||||
| CHAMBER SIZE | Φ1250 * H1250mm | ||||||
| CHAMBER TYPE | Cylinder, vertical, 1-door | ||||||
| SPUTTERING SYSTEM | Exclusively design for thin black film deposition | ||||||
| DEPOSITION MATERIAL | Aluminum, Silver, Copper, Chrome, Stainless Steel, Nickel |
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| DEPOSITION SOURCE | 2 sets MF Cylindrical Sputtering Targets + 8 Steered Cathodic Arc Sources + Ion Source For optional | ||||||
| GAS | MFC- 4 ways, Ar, N2, O2, C2H2 | ||||||
| CONTROL | PLC(Programmable Logic Controller) + | ||||||
| PUMP SYSTEM | SV300B - 1 set (Leybold) | ||||||
| WAU1001 - 1 sets (Leybold) | |||||||
| D60T- 1 set (Leybold) | |||||||
| Turbo Molecular Pumps: 2* F-400/3500 | |||||||
| PRE-TREATMENT | Bias power supply: 1*36 KW | ||||||
| SAFETY SYSTEM | Numerous safety interlocks to protect operators | ||||||
| COOLING | Cold Water | ||||||
| POWER ELECTRICAL | 480V/3 phases/60HZ ( USA compliant) | ||||||
| 460V/3 phases/50HZ ( Asia compliant) | |||||||
| 380V/3 phases/50HZ ( EU-CE compliant) | |||||||
| FOOTPRINT | L3000*W3000*H2000mm | ||||||
| TOTAL WEIGHT | 7.0 T | ||||||
| FOOTPRINT | ( L*W*H) 5000*4000 *4000 MM | ||||||
| CYCLE TIME | 30~40 minutes (depending on substrate material, substrate geometry and environmental conditions) |
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| POWER MAX.. | 155 KW | ||||||
| AVERAGE POWER CONSUMPTION (APPROX.) |
75 KW |
Customized machine sizes are also available based on specified demanded products.
Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.
