High Performance Vacuum Metal Deposition Equipment, CsI vacuum metallizer by Thermal Crucible
Keywords: high resolution, CsI: T1; thin scintillator films; X-ray imaging; vacuum deposition method, carbon layer post-deposition
CsI thin film deposition for X-ray Imaging devices is an advanced technique to evaporate CsI on the screen to give a high quality of imaging. With its high resolution performance, also widely used in security checking and inspection, high energy physics subjects , physics of nuclear energy areas etc.
The RTEP0913 thermal evaporation coating system was developed for CsI film deposition on X-ray imaging in high vacuum pressure environment. The CsI T1 scintillators ranging from 2 μm to 14 μm in thickness. The carbon layer film can be considered as post-deposition to improve high resolutions.
Cesium Iodide (CsI T1) Vacuum Deposition performance and characterizations
l Vertical orientation, Cylinder, 1-door, front opening.
l Ultra-high ultimate vacuum pressure : up to 9.0*10-5 Pa;
l Fast heating up devices for a good adhesion;
l Proper high vacuum pump selection and pumping system to avoid hazard material's exposed in the air;
l Robust, compact and solid coating system;
l High stability, working 960 hrs without stop.
l Inficon Film Thickness Controller device to monitor the film thickness inline.
l Exclusively crucibles design and selection for CsI deposition.
l Substrates coating, max. size: 500*500mm
l Advanced rack design concepts can load 2 pieces substrates per batch, highly enhance the production output.
1. Ultimate Vacuum Pressure: better than 9.0*10-5 Pa;
2. Operating Vacuum Pressure: 6.0*10-4 Pa ~9.0*10-4 Pa;
Base Vacuum pressure: 3.0*10-4 Pa
3. Pumping down Time: from 1 atm to 2.0×10-3 Pa≤25 minutes ( room temperature, dry, clean and empty chamber)
4. Deposition source: quartz crucible thermal evaporation
5. Operating Model: Full Automatically /Semi-Auto/ Manually
6. Heating: from room temperature up to max. 1000℃,
TFT glass substrate heating up time: from 0~250℃<40mins;
7. CsI deposition rate: 0～100nm/sec
8. CsI: T1 film thickness: up to 600μm
The vacuum coating machine contains key completed system listed below:
1. Vacuum Chamber
1.1 Size: Inner Diameter 900mm
Inner Height: 1300mm
1.2 Material: Vacuum Chamber SUS304
Door and flanges SUS304
Chamber strengthen structure: SS41 mild steel, with painted finishing surface treatment.
Chamber chassis SS41 mild steel with painted finishing surface treatment.
1.3 Evaporation Shield : SUS304
1.4 View Window: on chamber door
1.5 Vacuum Chamber Venting Valve (including silencer)
1.6 Door: SUS304 material
2. Roughing Vacuum Pumping System:
Oil rotary vane vacuum pump + roots pump ( Germany Pfeiffer )
3. High Vacuum Pumping System:
Magnetic Suspension Molecular Pump ( Germany Pfeiffer )
4. Electrical Control and Operation System- PLC+ Touch Screen
4.1 Main circuit: None-fuse breaker switch, electromagnetic switch, C/T in series type
4.2 Evaporation Power
4.3 Evaporation Control System
4.4 Operation System: Touch Screen + PLC, recipe control and data logging, Auto shutdown, auto evacuation, auto coating
4.5 Measuring System
Vacuum Pressure : Vacuum Gauge: Pirani + Penning gauge + Full range vacuum gauge
Temperature measuring device: Thermocouple
Film thickness controller: Inficon brand, SQC-310
4.6 Alarm System: Compressed air pressure , Cooling water flow, Mis-operation
4.7 Power Load Indicator: Voltage indicator and load current indicator
5. Deposition System
5.1 Deposition source: quartz crucible
5.2 Deposition material: CsI, Carbon
6.1 Air Compressed Valve Control System
6.2 Cooling Water System:Water flow pipe and switch valve system
Compressed Air: 5~8kg/cm2
Cooling Water: Water-In Temperature: 20~25℃, 200 Liter/min,
Water-In Pressure: 2~3 kg/cm2,
Power: 3 Phase 380V 50Hz(60Hz), 65kVA, average power consumption: 30KW
Installation Area: (L*W*H) 3000*200*2300mm
Exhaust: Vent for mechanical pumps
Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.