CsI thin film deposition for X-ray Imaging devices is an advanced technique to evaporate CsI on the screen to give a high quality of imaging. With its high resolution performance, also widely used in security checking and inspection, high energy physics subjects , physics of nuclear energy areas etc.
The RTEP0913 thermal evaporation coating system was developed for CsI film deposition on X-ray imaging in high vacuum pressure environment. The CsI T1 scintillators ranging from 2 μm to 14 μm in thickness. The carbon layer film can be considered as post-deposition to improve high resolutions.
Cesium Iodide (CsI T1) Vacuum Deposition performance and characterizations
Ultra- High Spatial Resolution of Imaging;
Fast response for sharper imaging;
Class leading edge-to-edge image areas;
Optical absorb layers or reflector layers;
Low patient X-ray dose;
Suitable for CCD and CMOS devices, especially in medical industries.
l Vertical orientation, Cylinder, 1-door, front opening.
l Ultra-high ultimate vacuum pressure : up to 9.0*10-5 Pa;
l Fast heating up devices for a good adhesion;
l Proper high vacuum pump selection and pumping system to avoid hazard material's exposed in the air;
l Robust, compact and solid coating system;
l High stability, working 960 hrs without stop.
l Inficon Film Thickness Controller device to monitor the film thickness inline.
l Exclusively crucibles design and selection for CsI deposition.
l Substrates coating, max. size: 500*500mm
l Advanced rack design concepts can load 2 pieces substrates per batch, highly enhance the production output.
1. Ultimate Vacuum Pressure: better than 9.0*10-5 Pa;
2. Operating Vacuum Pressure: 6.0*10-4 Pa ~9.0*10-4 Pa;
Base Vacuum pressure: 3.0*10-4 Pa
3. Pumpingdown Time: from 1 atm to 2.0×10-3Pa≤25 minutes ( room temperature, dry, clean and empty chamber)