High Density Magnetron Sputtering Deposition System For Hydrophobic Composition Film, PECVD Sputtering Machine
1 set
MOQ
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Price
High Density Magnetron Sputtering  Deposition System For Hydrophobic Composition Film, PECVD Sputtering Machine
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Features
Basic Infomation
Place of Origin: Made in China
Brand Name: ROYAL
Certification: CE certification
Model Number: RTSP1200
High Light:

silver plating machine

,

ion plating system

Payment & Shipping Terms
Packaging Details: Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.
Delivery Time: 16 weeks
Payment Terms: L/C, D/A, D/P, T/T
Supply Ability: 6 sets per month
Specifications
Deposition Sources: Balance/Unbalanced Closed Magnetic Filed
Applications: Automotive, Semiconductor, SiC Coating, DLC Film Deposition,
Film Thickness: Range From 100 Nm To 12μm, Thickness Tolerance ±5%
Product Description

                  Hydrophobic composition film and other functional films Sputtering Deposition System

 

 

Applications:

 

The RTSP1213 machine is a batch model sputtering system, can deposits various hard coatings, soft coatings, compound films and solid lubricating films on the metallic and non-metallic materials substrates. Applied to industries of Hydrogen Fuel Cell vehicles, photonics products, aerospace and other new energy industries.

 

Properties:

 

To improve the conductivity of surface;

 High corrosion resistance;

 High wear resistance;

 High hardness

 Hydrophobic composition film and other functional films

Available for compound coatings: metallic and non-metallic films.

Film thickness range from 100nm to 12μm, thickness tolerance ±5%
 Strong adhesion.

 Low tempering parts surface hardening treatment.

 

Type:

 

Vertical orientation, polyhedron structure, 2-doors (front and back )

 

Features:

  • Environmentally friendly system, no industrial waste water, air and noise pollution;
  • Easy Operation: Touch screen + PLC control and unique software program for one touch operation, more than 80% trouble shootings alarm.
  • Up to 10 processing recipes login and backup; high repeatability and diversity.
  • Special design of Carousel system for high uniformity of film deposition.
  • High productivity and high quality
  • Stable and reliable system, running 365 days * 24hrs ( maintenance and repair breaking time)
  • Efficiency pumping system: shorter vacuum piping lines for maximum piping speed with well known Europe brand pumps
  • Compact design occupy minimum installation space.

 

Technical Specifications

 

  • Performance

1. Ultimate Vacuum Pressure: better than 8.0*10-5 Pa;

  • Base Vacuum pressure: 3.0*10-4 Pa

3. Pumping down Time: from atm to 1.0×10-3 Pa≤15 minutes ( room temperature, dry, clean and empty chamber)

4. Deposition source: balanced/unbalanced sputtering cathodes

5. Operating Model: Full Automatically /Semi-Auto/ Manually

6. Heating: from room temperature up to max. 450℃,

7. Plasma cleaning and Plasma assist deposition: Anode Linear Ion Source

8. Magnetic Closed - Loop filed. (Unbalance/balance cathodes)

9. Bias Power supply for glow discharging.

  • Structure

The vacuum coating machine contains key completed system listed below:

 

1. Vacuum Chamber
1.1 Size: Inner Diameter 1200mm

Inner Height: 1300mm

1.2 Material: Vacuum Chamber SUS304

Door and flanges SUS304

Chamber strengthen structure: SS41 mild steel, with painted finishing surface treatment.

Chamber chassis SS41 mild steel with painted finishing surface treatment.

1.3 Sputtering Shield : SUS304

1.4 View Window: on chamber door - 4 sets ( 2 on each door)

1.5 Vacuum Chamber Venting Valve (including silencer)

1.6 Door: SUS304 material

 

2. Roughing Vacuum Pumping System:


Oil rotary vane vacuum pump +Roots pump + Holding Pump ( Leybold)

 

3. High Vacuum Pumping System:

 

Magnetic Suspension Molecular Pump ( Leybold )

  • Gate valves - 2 sets

4. Electrical Control and Operation System- PLC+ Touch Screen

 

4.1 Main circuit: None-fuse breaker switch, electromagnetic switch, C/T in series type

4.2 Sputtering Power Supply + Ion source power supply + Bias Power Supply ( Advanced Energy )

4.3 Sputtering deposition control system

4.4 Operation System: Touch Screen + PLC, recipe control and data logging, Auto shutdown, auto evacuation, auto coating

4.5 Measuring System

Vacuum Pressure : Vacuum Gauge: Pirani + Penning gauge + Full range vacuum gauge -- Europe brand

Temperature measuring device: Thermocouple
MFC: Mass Flow Controller ( 4 ways), digital display mode-- Europe brand

4.6 Alarm System: Compressed air pressure , Cooling water flow, Mis-operation

4.7 Power Load Indicator: Voltage indicator and load current indicator

 

5. Deposition System

5.1 Deposition source: Sputtering cathodes, Ion source -- Europe brand

5.2 Deposition material: Carbon target

 

6. Sub-System

6.1 Air Compressed Valve Control System

6.2 Cooling Water System:Water flow pipe and switch valve system

 

7.Working Environment

Compressed Air: 5~8kg/cm2

Cooling Water: Water-In Temperature: 20~25℃, 200 Liter/min,
Water-In Pressure: 2~3 kg/cm2,

 

Power: 3 Phase 380V 50Hz(60Hz), 75kVA, average power consumption: 40KW

Installation Area: (L*W*H) 3000*4000*3200mm

Exhaust: Vent for mechanical pumps

 

High Density Magnetron Sputtering  Deposition System For Hydrophobic Composition Film, PECVD Sputtering Machine 0

 

 

Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.

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Contact Person : Ms. ZHOU XIN
Fax : 86-21-67740022
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