Gold Magnetron Sputtering coating machine on glass, metal chips, 24K gold PVD deposition System
100 sets
MOQ
Gold Magnetron Sputtering coating machine on glass, metal chips, 24K gold PVD deposition System
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Features
Basic Infomation
Place of Origin: Made in China
Brand Name: ROYAL
Certification: CE certification
Model Number: RTSP
High Light:

magnetron sputtering machine

,

vacuum deposition equipment

Payment & Shipping Terms
Packaging Details: carton, case
Delivery Time: 10 weeks
Payment Terms: L/C, T/T, Western Union, MoneyGram, D/P, D/A
Supply Ability: 120 sets per month
Specifications
Sputtering Targets: Carbon, Copper, Aluminum, ITO, Ti, Cr, Stainless Steel Etc
Technology: DC/MF Magnetron Sputtering Cathode
Pre-cleaning: Linear Anode Ion Source Plasma Pre-treatment
Factory Location: Shanghai City, China
Factory Location: Shanghai City, China
Worldwide Service: Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America
Worldwide Service: Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America
Training Service: Machine Operation, Maintenance, Coating Process Recipes, Program
Training Service: Machine Operation, Maintenance, Coating Process Recipes, Program
Warranty: Limited Warranty 1 Year For Free, Whole Life For Machine
OEM & ODM: Available, We Support Tailor Made Design And Fabrication
Product Description

Copper/Aluminum/Carbon Sputtering Equipment, High Vacuum Magnetron Sputtering Deposition System

 

  • Anti Finger Print Coating
  • Plasma Hardening Treatment (PHT)
  • UHV Sputtering deposition system uses the sputtering cathodes as the PVD deposition sources. It always comibled MF sputter and DC sputters for indstrial PVD coating applications. Based on different targets and sputtering deposition speed's requests, Royal Technology provides cylidrical sputters and planar sputter cathodes, mainly for fast deposition rates to satisfy industrial production coating demand.

     

     

    High Vacuum Magnetron Sputtering Deposition System is designed for copper, alumunium, plastic, metal circuit board conductive film layer plating. It can condense Nano thin film on substrates. Except Ag sputtering, it can also deposit Ni, Au, Ag, Al, Cr, stainless steel targets.

    It can deposite high uniformity films on various substrates: plastic panle, PC panle, Aluminum sheet, Ceramic sheets, Al2O3 ceramic, AlN, Silicon sheets etc.

     

     

    RTSP1215 Sputtering Coating Equipment Layout

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    RTSP series Sputtering Coating Equipment Applications:

     

    1. Available on substrates of: Plastic, Polymer, Glass and ceramic sheets, Stainless steel, Copper sheet, Aluminum board etc.

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  • Gold Magnetron Sputtering coating machine on glass, metal chips, 24K gold PVD deposition System 0Gold Magnetron Sputtering coating machine on glass, metal chips, 24K gold PVD deposition System 1Gold Magnetron Sputtering coating machine on glass, metal chips, 24K gold PVD deposition System 2Gold Magnetron Sputtering coating machine on glass, metal chips, 24K gold PVD deposition System 3

  • 2. To generate Nano film like: TiN, TiC, TiCN, Cr, CrC, CrN, Cu, Ag, Au, Ni, Al etc.

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    RT-SP series Sputtering Coating Equipment Design Features:

     

    1. Robust design, good for limited room space

    2. Easy access for maintenance and repair

    3. Fast pumping system for high yield

    4. CE standard electrical enclosure, UL standard is also available.

    5. Accurate fabrication workmanship

    6. Stable running to guarantee high quality film production.

     

     

    Ion source is original from Gencoa company, the properties:

     

    1. Optimized magnetic fields to produce a collimated plasma beam at standard sputtering pressures

    2. Automated regulation for the gas to maintain constant current & voltage – multi-gas auto control

    3. Graphite anode and cathode to protect the substrate from contamination and provide long-life components

    4. RF standard electrical insulation on all ion sources

    5. In-direct cooling of anode and cathode – quick switching of parts

    6. Easy switching of cathode parts to provide multiple magnetic traps for lower voltage operation, or a focused beam

    7. Voltage regulated power supply with gas adjustment feedback to maintain same current at all times

     

     

    High Vacuum Magnetron Sputtering Deposition System Technical Specifications:

     

    MODEL RT1215-SP
    MATERIAL Stainless Steel (S304)
    CHAMBER SIZE Φ1200*1500mm (H)
    CHAMBER TYPE 1-door structure, Vertical
    SINGLE PUMP PACKAGE Rotary VaneVacuum Pump
    Roots Vacuum Pump
    Magnetic Suspension Molecular Pump
    Two-stage rotary vane vacuum pump
    TECHNOLOGY MF Magnetron Sputtering, Linear Ion Source
    POWER SUPPLY Sputtering power supply + Bias Power supply + Ion Source
    DEPOSITION SOURCE 4 pairs MF Sputtering Cathodes + Ion Source + DC sputters
    CONTROL PLC+Touch Screen
    GAS Gas Mass Flow Meters ( Ar, N2, C2H2, O2) Argon, Nitrogen and Ethyne,Oxygen
    SAFETY SYSTEM Numerous safety interlocks to protect operators and equipment
    COOLING Cooling Water
    CLEANING Glow Discharge/Ion Source
    POWER MAX. 120KW
    AVERAGE POWER CONSUMPTION 70KW

     

     

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