Magnetron Sputtering Coating Technology enables for mirros high throughput demand due to its fast deposition rate.
Unlikely the in-line sputtering system, the low production cost makes it possible for the entrepreneurs who are aming to start the business at a low investment.
Key Features:
Hight througput and large bath capability.Highly transparent, electrically conductive, highly reflective solar collectors, selectively reflective corrosion-proof, anti-glaring blue.
General Information
Various coating processes for automotive mirrors has been developed and qualified. Chromium PVD
coating onto float glass substrates as reflection layer is accomplished by DC-Magnetron sputtering.
Colour appearance of the layers can be generated by introducing of reactive gases, like Argon, Oxgen and Nitrogen.
Technical Specifications
|
Description |
For Car Mirror | For Car Wheels | ||
| RTSP1400-PLUS | RTSP900 | RTSP1400 | RTSP1800 | |
| Targets Aavailable | Chrominum, Aluminum, Stainless Steel, Copper, Brass, Titanium, Silver etc. | |||
|
Capacity
|
Max. 4.86 sqm |
Max. size : 27" x 1 Unit
|
Max. size 25" x 4 Units Max. size : 27" x 2 Units |
Max. size 22" x 8 Units
|
| Deposition Chamber |
φ1400 *H1600mm
|
φ900 * H900mm
|
φ1400 * H1600mm
|
φ1800 * H1800mm
|
|
Load Diameter (Max.) |
6*φ360mm | 1 axis | 1 axis |
4 axis * φ560mm
|
| Load Height ( Effective) |
1200mm | 700mm | 1100mm | 1400mm |
| Deposition Sources |
4 sets cylinder sputter 1 set planar sputter |
2 sets planar sputter W125*L850mm | 2 sets planar sputter W125*L1350mm | 2 sets planar sputter W125*L1650mm |
| Sputtering Power | Max. 40KW | Max. 30KW | Max. 40KW | Max. 60KW |
| Operation & Control System |
CE standard Mitsubishi PLC+ Touch Screen Operation Program with backup
|
|||
What is magnetron sputtering technology?
Magnetron sputtering is another form of PVD coating technology.
Plasma coating
Magnetron sputtering is a plasma coating process whereby sputtering material is ejected due to bombardment of ions to the target surface. The vacuum chamber of the PVD coating machine is filled with an inert gas, such as argon. By applying a high voltage, a glow discharge is created, resulting in acceleration of ions to the target surface and a plasma coating. The argon-ions will eject sputtering materials from the target surface (sputtering), resulting in a sputtered coating layer on the products in front of the target.
Reactive sputtering
Often an additional gas such as nitrogen or acetylene is used, which will react with the ejected material (reactive sputtering). A wide range of sputtered coatings is achievable with this PVD coating technique. Magnetron sputtering technology is very advantageous for decretive coating (e.g. Ti, Cr, Zr and Carbon Nitrides), because of its smooth nature. The same advantage makes magnetron sputtering widely used for tribological coating in automotive markets (e.g. CrN, Cr2N and various combinations with DLC coating - Diamond Like Carbon coating).
Magnetic fields
Magnetron sputtering is somewhat different from general sputtering technology. The difference is that magnetron sputtering technology uses magnetic fields to keep the plasma in front of the target, intensifying the bombardment of ions. A highly dense plasma is the result of this PVD coating technology.
Magnetron sputtering technology is characterized by:
