Watch band, bracelets and watch case IPG gold plating
2 sets
MOQ
negotiable
Price
Watch band, bracelets and watch case IPG gold plating
Features Gallery Product Description Request A Quote
Features
Basic Infomation
Place of Origin: Made in China
Brand Name: ROYAL
Certification: CE
Model Number: RTAS
High Light:

thin film coating equipment

,

dlc coating equipment

Payment & Shipping Terms
Packaging Details: Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.
Delivery Time: 11 weeks
Payment Terms: L/C, T/T
Supply Ability: 6 sets per month
Specifications
Deposition Sources: Sputter + Ion Source PECVD Process
Technique: PVD, Balanced/Unbalanced Magentron Sputtering Cathode
Coating Technology: Vacuum Magnetic Coating, Arc Evaporation, Magnetron Sputtering Deposition
Name: Ion Plating Machine
Product Description

 
PVD Vacuum Coating Machine / Magnetron Sputtering Coating Machine, metallurgical pvd coating machine
 
This machine is suitable to the industrial production vacuum coating system. It equips a big size plain arc ion evaporation source and can deposite high performance hard metal film by arc evaporation technology, such as TiN, TiCN,AlTiN and all kinds of other special film according to customer’s requirements.
DLC coating (diamond-like carbon) is the combination of diamond (SP3) and graphite (SP2). The physical and chemical properties of DLC are intermediate to that of diamond and graphite

 

  • Strong adhesion of the deposited films to the surface;
  • Hardness of the coating comparable to diamond hardness;
  • Durability;
  • Low coefficient of friction;
  • Chemical stability;
  • Ecological cleanliness;
  • Biological compatibility;
  • Transparency in the infra-red band of the spectrum;
  • High heat conductivity;
  • Corrosion resistance;
  • High electrical resistance

 
 Specifications
 

MODEL RTAS1000
TECHNOLOGY    arc plating + magnetron sputtering + ion source
CHAMBER MATERIAL Stainless Steel (S304)
CHAMBER SIZE Φ1000*1000mm (H)
CHAMBER TYPE Regular octahedron chamber, 2-doors
ROTATION RACK & JIG SYSTEM 6 (8)satellite, Max. weight: 400kgs
POWER SUPPLIES Qty. of Sputtering: 2*24 KW Bias of Power Supply: 1*24W AE power supply for option Ion Source Power supply 2 sets, AE power supply for option
DEPOSITION MATERIAL  Ti, Zr, TiAl, Cu, Au 
DEPOSITION SOURCE

2 pairs (4 pieces) Sputtering Cathodes +  6 arcs                  Coating Area: Dia800mm*H550mm;
Uniformity Area: ±10~15%

CONTROL PLC(Programmable Logic Controller) + Touch Screen ( manual+ auto+ semi-auto operation models)
PUMP SYSTEM Rotary Vane Pump: SV300B - 1 set (Leybold)
Roots Pump: WAU1001 - 1 set (Leybold)
Holding Pump: D60C-1set- (Leybold)
Magnetric Rotor Suspension Molecular Pump: MAG2200 - 2 sets (Leybold)
GAS MASS FLOW CONTROLLER 3 channels, Made in America (MKS brand)
VACUUM GAUGE Model: ZDF-X-LE, Made in China
Linear Ion Source 2 pieces Pre-treating, plasma cleaning + assisted deposition
SAFETY SYSTEM Numerous safety interlocks to protect operators and equipment
HEATING Heaters: 20KW. Max. temp.: 400℃
COOLING Industrial Chiller (Cold Water)
POWER MAX. 100KW (Approx.)
AVERAGE POWER CONSUMPTION 45 KW (Approx.)
GROSS WEIGHT T (Approx.)
FOOT PRINT ( L*W*H) 4000*4000 *4000 MM
POWER ELECTRICAL AC 380V/3 phases/50HZ

 

 

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Get in touch with us
Contact Person : Ms. ZHOU XIN
Fax : 86-21-67740022
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