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PVD+PECVD Vacuum Deposition System, DLC film coating by PECVD process

1 set
PVD+PECVD Vacuum Deposition System, DLC film coating by PECVD process
Features Gallery Product Description Request A Quote
Chamber: Vertical Orientation, 2-doors
Deposition Sources: Balance/Unbalanced Closed Magnetic Filed
Technique: PECVD, Balanced/Unbalanced Magentron Sputtering Cathode
Applications: Automotive, Semiconductor, SiC Coating, DLC Film Deposition,
Film Features: Wear Resistance, Strong Adhesion, Decorative Coating Colors
Factory Location: Shanghai City, China
Worldwide Service: Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America
Training Service: Machine Operation, Maintenance, Coating Process Recipes, Program
Warranty: Limited Warranty 1 Year For Free, Whole Life For Machine
OEM & ODM: Available, We Support Tailor Made Design And Fabrication
High Light:

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high vacuum coating machine

Basic Infomation
Place of Origin: Made in China
Brand Name: ROYAL
Certification: CE
Model Number: Multi950
Payment & Shipping Terms
Packaging Details: Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.
Delivery Time: 16 weeks
Payment Terms: L/C, T/T
Supply Ability: 26 sets per month
Product Description

Royal Technology Multi950
——PVD + PECVD Vacuum Deposition Machine

he Multi950 machine is a customized multiple function vacuum deposition system for R&D.

After intense exchanges with Shanghai University’s team lead by Professor Chen, we finally confirmed the design and configuration to fulfil their R&D applications. This system is able to deposit transparent DLC film with the PECVD process, hard coatings on tools, and optical film with sputtering cathode. Based on this pilot machine design concept, we have developed 3 other coating systems afterwards:

1. Bipolar Plate Coating for Fuel Cell Electric Vehicles- FCEV1213

2. Ceramic Direct Plated Copper- DPC1215

3. Flexible Sputtering System- Copper PCB Gold Plating System

These 3 machines all have an Octagonal chamber, which allow flexible and reliable performances in various applications. It satisfies the coating processes and requires many different metal layers: Al, Cr, Cu, Au, Ag, Ni, Sn, SS and many other non-ferromagnetic metals. Plus the Ion source unit, efficiently enhances films adhesion on different substrate materials with its plasma etching performance and, the PECVD process to deposit some carbon-based layers.

The Multi950 is the milestone of advanced design coating systems for Royal Technology. Thanks to students of Shanghai University and Professor Yigang Chen leading them with his creative and selfless dedication, were we able to convert his valuable information into a state of the art machine.

In the year 2018, we had another project cooperation with Professor Chen,
the C-60 material deposition by Inductive thermal evaporation method.
Mr. Yimou Yang and Professor Chen were fundamental for these innovative projects.

PVD+PECVD Vacuum Deposition System, DLC film coating by PECVD process 0

Technical Advantages 

  • Compact Footprint
  • Standard Modular Design
  • Flexible
  • Reliable
  • Octagonal Chamber Structure
  • 2-door Structure For Easy Access
  • PVD + PECVD processes

Design Features

1. Flexibility: Arc and sputtering cathodes, Ion source mounting flanges are standardized for flexible exchange

2. Versatility: It can deposit a variety of base metals and alloys; optical coatings, hard coatings, soft coatings, compound films and solid lubricating films on the metallic and non-metallic materials substrates

3. Straight forward design: 2-door structure, front & rear opening for easy maintenance

PVD+PECVD Vacuum Deposition System, DLC film coating by PECVD process 1

Technical Specifications

Model: Multi-950

Deposition chamber (mm)

Diameter x Height: φ950 x 1350

Deposition Sources : 1 pair of MF sputtering cathodes

1 pair of PECVD

8 sets arc cathodes

1 set Linear Ion Source

Plasma Uniformity Zone (mm): φ650 x H750

Carousel: 6 xφ300

Powers (KW) Bias: 1 x 36

MF Sputtering Power (KW): 1 x 36

PECVD (KW): 1 x36

Arc (KW): 8 x 5

Ion Source (KW): 1 x 5

Gas Control System MFC: 4 + 1

Heating System: 18KW, up to 500℃, with thermal couple PID control

High Vacuum Gate Valve: 2

Turbo molecular pump: 2 x 2000L/S

Roots Pump: 1 x 300L/S

Rotary Vanes Pump: 1 x 90 m³/h + 1 x 48 m³/h

Footprint (L x W x H ) mm: 3000 * 4000 * 3200

Total Power (KW): 150


PVD+PECVD Vacuum Deposition System, DLC film coating by PECVD process 2 PVD+PECVD Vacuum Deposition System, DLC film coating by PECVD process 3

Built Time: 2015

Location: Shanghai University, China

PVD+PECVD Vacuum Deposition System, DLC film coating by PECVD process 4
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Contact Person : ZHOU XIN
Fax : 86-21-67740022
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