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Place of Origin: | Made in China |
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Brand Name: | ROYAL |
Certification: | CE |
Model Number: | RTAS1250 |
Minimum Order Quantity: | 1 set |
Price: | negotiable |
Packaging Details: | Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation. |
Delivery Time: | 24 weeks |
Payment Terms: | L/C, D/A, D/P, T/T |
Supply Ability: | 2 sets per month |
Coating Technology: | Sputtering, Evaporation, Plasma Treater | Equipment Features: | Robust Structure, Compact Footprint Design, High Efficiency And Precision Oepration Control |
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Coating Application: | Electronic Paper, ITO Film, Flexible Circuits, Photovoltaic, Medical Strips And RFID. | Operation Control: | Intuitive PLC And IPC Control |
Service And Training: | Available, From The USA Engineer And Technicians | Name: | Thin Film Coating Machine |
High Light: | silver plating machine,vacuum plating equipment |
DC and MF Magnetron Sputtering Coating Machine, Deep Black PVD Coating Solutions
Magnetron Sputtering Coating
Plasma coating
Magnetron sputtering is a plasma coating process whereby sputtering material is ejected due to bombardment of ions to the target surface. The vacuum chamber of the PVD coating machine is filled with an inert gas, such as argon. By applying a high voltage, a glow discharge is created, resulting in acceleration of ions to the target surface and a plasma coating. The argon-ions will eject sputtering materials from the target surface (sputtering), resulting in a sputtered coating layer on the products in front of the target. Magnetron sputtering technology is characterized by:
MODEL | RTAC1250-SPMF | ||||||
TECHNOLOGY | MF Magnetron Sputtering + Ion Plating | ||||||
MATERIAL | Stainless Steel (S304) | ||||||
CHAMBER SIZE | Φ1250 * H1250mm | ||||||
CHAMBER TYPE | Cylinder, vertical, 1-door | ||||||
SPUTTERING SYSTEM | Exclusively design for thin black film deposition | ||||||
DEPOSITION MATERIAL | Aluminum, Silver, Copper, Chrome, Stainless Steel, Nickel |
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DEPOSITION SOURCE | 2 sets MF Cylindrical Sputtering Targets + 8 Steered Cathodic Arc Sources + Ion Source For optional | ||||||
GAS | MFC- 4 ways, Ar, N2, O2, C2H2 | ||||||
CONTROL | PLC(Programmable Logic Controller) + | ||||||
PUMP SYSTEM | SV300B - 1 set (Leybold) | ||||||
WAU1001 - 1 sets (Leybold) | |||||||
D60T- 1 set (Leybold) | |||||||
Turbo Molecular Pumps: 2* F-400/3500 | |||||||
PRE-TREATMENT | Bias power supply: 1*36 KW | ||||||
SAFETY SYSTEM | Numerous safety interlocks to protect operators | ||||||
COOLING | Cold Water | ||||||
POWER ELECTRICAL | 480V/3 phases/60HZ ( USA compliant) | ||||||
460V/3 phases/50HZ ( Asia compliant) | |||||||
380V/3 phases/50HZ ( EU-CE compliant) | |||||||
FOOTPRINT | L3000*W3000*H2000mm | ||||||
TOTAL WEIGHT | 7.0 T | ||||||
FOOTPRINT | ( L*W*H) 5000*4000 *4000 MM | ||||||
CYCLE TIME | 30~40 minutes (depending on substrate material, substrate geometry and environmental conditions) |
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POWER MAX.. | 155 KW | ||||||
AVERAGE POWER CONSUMPTION (APPROX.) |
75 KW |
Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.