PECVD Thin Film Coating Machine, Ion Source Plasma Enhanced PVD Deposition System
Advanced production machineries (milling, welding,cutting,vacuum leak testing)combined with standardized production procedures and strict tests enable Royal Technology to produce high quality, reliable and low cost coating systems.
Quality, service and on-time delivery are the core principles of Royal technology’s business. A strategy of openly outsourcing simple components to professional manufactures allows us to focus attention to key parts and components R&D, manufacturing.
Strict quality control policies and rigorous selection of qualified suppliers assure Royal Technology’s customers receive the most advanced, high-end quality equipment at the most affordable cost.
The core technology is how to generate the electrical energy with fuel cell power module through electrochemical reaction between hydrogen as fuel and oxygen.
Hydrogen fuel cell as the most key important part of the power module, scientists, engineers, professors from transportation organizations and worldwide vehicles manufactures have made thousands tests and finally found the proper processing.
It is 100% envrionmetally friendly technology and vechiles.
Our machine RTSP1200 model is exclusively designed and developed for this appliation. We cooperated with Shanghai Jiaotong Unversity and SAIC Motor Corporation Limited Company.
Hydrogen Fuel Cell Power Module Sputtering System with the PECVD (Plasma Enhanced Chemical Vapor Deposition) Technology to deposit high uniformity, strong adhesion SiC thin films.
The Hydrogen fuel cell sputtering machine contains ion source, balanced/unblanced sputtering cathodes; with stable and large volume vacuum pumping system.
Hydrogen Fuel Cell Power Module Sputtering System Specifications
|MATERIAL||Stainless Steel (S304)|
|CHAMBER SIZE||Φ1200*1300mm (H)|
|CHAMBER TYPE||Front and back 2-doors structure, Vertical|
|SINGLE PUMP PACKAGE||Rotary Piston Vacuum Pump|
|Roots Vacuum Pump|
|Magnetic Suspension Molecular Pump|
|Rotary Vane Pump (Holding Pump)|
|TECHNOLOGY||Magnetron Sputtering, Ion Source PECVD|
|POWER SUPPLY||Sputtering power supply + Bias Power supply + Ion Source|
|DEPOSITION SOURCE||2 pairs DC/RF Sputtering Cathodes + (2 pairs spare using) + Ion Source|
|GAS||Gas Mass Flow Meters ( Ar, N2, C2H2, O2) Argon, Nitrogen and Ethyne,Oxygen|
|SAFETY SYSTEM||Numerous safety interlocks to protect operators and equipment|
|CLEANING||Glow Discharge/Ion Source|
|AVERAGE POWER CONSUMPTION||75KW
The special designed rack and jig system can take out-move in completely for a substrates convenient loading/unloading.
Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.
|Contact Person :||Ms. ZHOU XIN|