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PVD PECVD Vacuum Deposition Machine / Polyhedron Structure Vacuum Coating Machine

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Good quality Magnetron Sputtering Coating Machine for sales
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I am appreciate Royal's excellent cooperation for my ODM project. From first touch till finished product, only 6 months, amazing quality & service!

—— Mr. Wu

Royal has built 3 sets machine for our lab. R&D applications. Theirs patience, fast response and knowledge are remarkable, great cooperation always.

—— Professor Chen

Royal provided us the ODM CsI coating machine successfully. We continued to purchased the other four sets within 2 years, excellent team!

—— Mr. Lee

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PVD PECVD Vacuum Deposition Machine / Polyhedron Structure Vacuum Coating Machine

China PVD PECVD Vacuum Deposition Machine / Polyhedron Structure Vacuum Coating Machine supplier

Large Image :  PVD PECVD Vacuum Deposition Machine / Polyhedron Structure Vacuum Coating Machine

Product Details:

Place of Origin: China
Brand Name: ROYAL
Certification: CE
Model Number: Multi950

Payment & Shipping Terms:

Minimum Order Quantity: 1 set
Price: depends on
Packaging Details: Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.
Delivery Time: 14~16weeks
Payment Terms: L/C, T/T
Supply Ability: 10 sets per month
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Detailed Product Description
Equipment Model: Polyhedron Structure Deposition Sources: Arc + DC/MF Sputtering
Technology: PECVD Process, PVD Plating Material: SS304/SS316L
Applications: DLC, Hard Films, Optical Film Coating By Magnetron Sputtering

              PVD + PECVD Vacuum Deposition Machine , Polyhedron structure PVD equipment, Multiple Deposition Sources
 

Multi950 machine properties: 

 

Compact Footprint,
Standard Modular Design,
Flexible,
Reliable,
Octal Chamber,
2-door structure for good access,
PVD + PECVD processes.


Design Features:


1. Flexibility: Arc and sputtering cathodes, Ion source mounting flanges are standardized for flexible exchange;
2. Versatility: can deposit variety of base metals and alloys; optical coatings, hard coatings, soft coatings, compound films and solid lubricating films on the metallic and non-metallic materials substrates.
3. Straight forward design: 2-door structure, front & back opening for easy maintenance.

 

 

The Multi950 machine is a customized multiple functions vacuum deposition system for R&D. With half year’s discussion with Shanghai University’s team leaded by Professor Chen, we finally confirmed the design and configurations to fulfill theirs R&D applications. This system is able to deposit transparent DLC film with PECVD process, hard coatings on tools, and optical film with sputtering cathode. Based on this pilot machine design concept, we have developed 3 other coating systems after then:


1. Bipolar Plate Coating for Fuel Cell Electric Vehicles- FCEV1213,
2. Ceramic Direct Plated Copper- DPC1215,
3. Flexible Sputtering System- RTSP1215.


These 4 models machine are all with Octal chamber, flexible and reliable performances are extensively used in various applications. It satisfy the coating processes require multi different metal layers: Al, Cr, Cu, Au, Ag, Ni, Sn, SS and many other non-feeromagnetic metals;
plus the Ion source unit, efficiently enhance films adhesion on different substrate materials with its plasma etching performance and, the PECVD process to deposit some carbon-based layers.

 

The Multi950 is the milestone of advanced design coating systems for Royal Tech. Here, we grateful thanks Shanghai University students and especially Process Yigang Chen, his creative and selfless dedication are unlimited values and inspired our team.

 

In year 2018, we had another project cooperation with Pressor Chen, the C-60 material deposition by
Inductive thermal evaporation method. We heartfully thank Mr. Yimou Yang and Professor Chen's leading and instruction on every innovative project.

 

 

Multi950 - Technical Specifications

 

Description Multi-950

Deposition chamber (mm)

Width x Depth x Heigh

1050 x 950 x 1350

 

 

 

Deposition Sources

1 pair of MF sputtering cathodes
1 pair of PECVD
8 sets arc cathodes
Linear Ion Source 1 set
Plasma Uniformity Zone (mm) φ650 x H750
Carousel 6 x φ300

 

 

 

Powers (KW)

Bias: 1 x 36
MF: 1 x 36
PECVD: 1 x36
Arc: 8 x 5
Ion Source: 1 x 5
Gas Control System MFC: 4 + 1
Heating System 500℃, with thermalcouple PID control
High Vacuum Gate Valve 2
Turbomolecular pump 2 x 2000L/S
Roots Pump 1 x 300L/S
Rotary Vanes Pump 1 x 90 m³/h + 1 x 48 m³/h
Footprint (L x W x H ) mm 3000 * 4000 * 3200
Total Power (KW) 150


Royal Tech's service and engineering teams provide customer support onsite, contact us for your applications!

 

Contact Details
SHANGHAI ROYAL TECHENOLOGY INC.

Contact Person: Ms. Zhou

Tel: +8615316373076

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