August 10, 2018
------------------- The article is by Donald M. Mattox
Ion plating (IP) is a physical vapor deposition (PVD) process that is sometimes called ion assisted deposition (IAD) or ion vapor deposition (IVD) and is a version of vacuum deposition. Ion plating uses concurrent or periodic bombardment of the substrate, and deposits film by atomic-sized energetic particles. Bombardment prior to deposition is used to sputter clean the substrate surface. During deposition the bombardment is used to modify and control the properties of the depositing film. It is important that the bombardment be continuous between the cleaning and the deposition portions of the process to maintain an atomically clean interface.
In ion plating the energy, flux and mass of the bombarding species along with the ratio of bombarding particles to depositing particles are important processing variables. The depositing material may be vaporized either by evaporation, sputtering (bias sputtering), arc vaporization or by decomposition of a chemical vapor precursor chemical vapor deposition (CVD). The energetic particles used for bombardment are usually ions of an inert or reactive gas, or, in some cases, ions of the condensing film material (“film ions”). Ion plating can be done in a plasma environment where ions for bombardment are extracted from the plasma or it may be done in a vacuum environment where ions for bombardment are formed in a separate ion gun. The latter ion plating configuration is often called Ion Beam Assisted Deposition (IBAD). By using a reactive gas or vapor in the plasma, films of compound materials can be deposited.
Ion plating is used to deposit hard coatings of compound materials on tools, adherent metal coatings, optical coatings with high densities, and conformal coatings on complex surfaces.
Shanghai Royal Technology developed several series standardized PVD vacuum coating machine based the ion plating technique, extensively applied with various decorative coatings and functional films like: hard coatings, corrosion and scratch wearing properties, high conduction and reflective coatings.
These machines equipped the ion bombardment device for plasma cleaning pretreatment, introduce in the iner gas like Ar, H2 to acritive the substrate surface, approve adhesion between substrate and depostion films.
The bonding layer is required for special substrate sometimes. Royal Technology aiming to provides the total turnkey coating solutions for every end user.
Magnetron Sputtering Vacuum Deposition System
Multi Arc Vacuum Coating Machine
Multi Arc + Magnetron Sputtering Coating Equipment
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