TiN Gold Metal Magnetron Sputtering Coating Machine , ZrN Gold Plating Service
10 set
MOQ
negotiable
Price
TiN Gold Metal Magnetron Sputtering Coating Machine , ZrN Gold Plating Service
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Features
Basic Infomation
Place of Origin: Made in China
Brand Name: ROYAL
Certification: CE
Model Number: RTAS1250
High Light:

gold coating machine

,

physical vapor deposition equipment

Payment & Shipping Terms
Packaging Details: Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.
Delivery Time: 12 weeks
Payment Terms: L/C, D/A, D/P, T/T
Supply Ability: 6 sets per month
Specifications
Deposition Sources: Steered Cathodic Arc + MF Sputtering Cathode
Technique: PVD, Balanced/Unbalanced Magentron Sputtering Cathode
Applications: Al2O3, AlN Ceramic Circuit Boards, Al2O3 Plates On LED, Semiconductor
Film Features: Wear Resistance, Strong Adhesion, Decorative Coating Colors
Factory Location: Shanghai City, China
Factory Location: Shanghai City, China
Worldwide Service: Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America
Worldwide Service: Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America
Training Service: Machine Operation, Maintenance, Coating Process Recipes, Program
Warranty: Limited Warranty 1 Year For Free, Whole Life For Machine
OEM & ODM: Available, We Support Tailor Made Design And Fabrication
OEM & ODM: Available, We Support Tailor Made Design And Fabrication
Product Description

 
 
TiN gold Metal Mid-Frequency Magnetron Sputtering Coating Machine / MF Sputtering System  
 
 
 
Magnetron Sputtering Vacuum Coating is a type of PVD Ion Plating surface treatment menthod. It can be used for the production of conducting or non conducting films, on many types materials: metals, glass, ceramic, plastic, metal alloy. The sputtering deposition concept: the coating material (target, also named cathode) and the work pieces (substrates, also called anode) are placed into the vacuum chamber and the pressure is reduced. Sputtering is initiated by placing the target under a voltage differintial and introducing Argon gas that form argon ions (glow discharge). The argon ions accelerate toward the process target and displace target atoms. These sputtering atoms are then condensed onto the substrate and form very thin and high uniformity layer. Various colors can be achieved by introducing reactive gases like, nitrogen, oxgen, or acetylene into hte sputter gass during coating process.
 
Magnetron Sputtering Models: DC Sputtering, MF Sputtering, RF Sputtering
 
What is MF Sputtering?
 
Compared with DC and RF sputtering, Mid-Frequency sputtering has become a main thin film sputtering technique for mass production of coating, particularly for the film deposition of dielectric and non-conductive film coatings on surfaces such as optical coatings, solar panels, multiple layers, composite material film etc.
It is replacing RF sputtering due to it operated with kHz rather than MHz for a much faster deposition rate and also can avoid the Target poisoning during compound thin film deposition like DC.
 
MF sputtering targets always existed with two-sets. Two cathodes are used with an AC current switched back and forth between them which cleans the target surface with each reversal to reduce the charge build up on dielectrics that leads to arcing which can spew droplets into the plasma and prevent uniform thin film growth--- which is what we called Target Poisoning.
 
MF Sputtering System Performance
1. Ultimate Vacuum Pressure: better than 5.0×10-6 Torr.
2. Operating Vacuum Pressure: 1.0×10-4 Torr.
3. Pumpingdown Time: from 1 atm to 1.0×10-4 Torr≤ 3 minutes ( room temperature, dry, clean and empty chamber)
4. Metalizing material (sputtering + Arc evaporation): Ni, Cu, Ag, Au, Ti, Zr, Cr, TiN, TiC, TiAlN, CrN, CrC, etc.
5. Operating Model: Full Automatically /Semi-Auto/ Manually
 
MF Sputtering System Structure
The vacuum coating machine contains key completed system listed below:
1. Vacuum Chamber
2. Rouhging Vacuum Pumping System (Backing Pump Package)
3. High Vacuum Pumping System ( Magnetically Suspension Molecular Pump)
4. Electrical Control and Operation System
5. Auxiliarry Facility System (Sub System)
6. Deposition System: MF sputtering cathode, MF power supply, Bias Power Supply Ion source for optional
 
MF Sputtering System RTSP1212-MF Specifications
 

MODEL RTSP1212-MF
TECHNOLOGY MF Magnetron Sputtering + Ion Plating
MATERIAL Stainless Steel (S304)
CHAMBER SIZE Φ1250*H1250mm
CHAMBER TYPE Cylinder, vertical, 1-door
SPUTTERING SYSTEM Exclusively design for thin black film deposition
DEPOSITION MATERIAL Aluminum, Silver, Copper, Chrome, Stainless Steel,
Nickel
DEPOSITION SOURCE 2 sets MF Cylindrical Sputtering Targets + 8 Steered Cathodic Arc Sources
GAS MFC- 4 ways, Ar, N2, O2, C2H2
CONTROL PLC(Programmable Logic Controller) +
PUMP SYSTEM SV300B - 1 set (Leybold)
WAU1001 - 1 sets (Leybold)
D60T- 2sets (Leybold)
Turbo Molecular Pumps: 2* F-400/3500
PRE-TREATMENT Bias power supply: 1*36 KW
SAFETY SYSTEM Numerous safety interlocks to protect operators
COOLING Cold Water
POWER ELECTRICAL 480V/3 phases/60HZ ( USA compliant)
460V/3 phases/50HZ ( Asia compliant)
380V/3 phases/50HZ ( EU-CE compliant)
FOOTPRINT L3000*W3000*H2000mm
TOTAL WEIGHT 7.0 T
FOOTPRINT ( L*W*H) 5000*4000 *4000 MM
CYCLE TIME 30~40 minutes (depending on substrate material,
substrate geometry and environmental conditions)
POWER MAX.. 155 KW

AVERAGE POWER
CONSUMPTION (APPROX.)

75 KW





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Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.

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