Magnetron Sputtering Sources Specification
Key Features
1. Finite element magnetic field design
2. Magnet isolated from cooling water
3. Compatible with DC/MF and RF Powers
4. High target utilization
5. Adjustable ejecting direction
6. High power density and excellent uniformity
7. Balanced and unbalanced mode choice
8. Target Utilization: > 80%
Applications:
For rose gold, jet black, blue colors deposition and conductive film coating. Can be installed on vertical and horizontal PVD magnetron Sputtering coating systems.
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