Leave a Message
We will call you back soon!
Your message must be between 20-3,000 characters!
Please check your E-mail!
More information facilitates better communication.
Submitted successfully!
We will call you back soon!
Leave a Message
We will call you back soon!
Your message must be between 20-3,000 characters!
Please check your E-mail!
Place of Origin: | Made in China |
---|---|
Brand Name: | ROYAL |
Certification: | CE |
Model Number: | RTAS1000 |
Minimum Order Quantity: | 1 set |
Price: | negotiable |
Packaging Details: | Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation. |
Delivery Time: | 8 to 12 weeks |
Payment Terms: | L/C, T/T |
Supply Ability: | 5 sets per month |
Name: | Tantalum PVD Sputtering Deposition Machine | Coatings: | Tantalum, Gold, Silver Etc. |
---|---|---|---|
Technology: | Pulsed DC Sputtering | Application: | Microelectronics Industry,Medical Instruments ,Coatings On Corrosion Resistant Parts,, |
Ta Film Properties: | Tantalum Is Most Used In The Electronic Industry As A Protective Coating Because Of Its Good Resistance To Erosion. | ||
High Light: | vacuum coating plant,high vacuum coating machine |
Magnetron Sputtering is widely used to deposit refractory metals like tantalum, titanium, tungsten, niobium, which would require very high temperatures of deposition, and precious metals: Gold and Silver and which is also used for deposition of lower melting points metals like copper, aluminum, nickle, chrome etc.
Tantalum is most used in the electronic industry as a protective coating because of its good resistance to erosion.
Applications of Sputtered Tantalum thin film:
1. Microelectronics industry as the films can be reactively sputtered and thus resistivity and temperature coefficient of resistance can be controlled;
Technical Advantages
Royal Technology’s standardized Tantalum sputtering deposition system:
Main Configurations | |
MODEL | RTAS1000 |
TECHNOLOGY |
Pulsed DC magnetron sputtering Cathodic arc plating (for option, determined by coating process) |
CHAMBER MATERIAL | Stainless Steel (S304) |
CHAMBER SIZE | Φ1000*1000mm (H) |
CHAMBER TYPE | D shape, cylindrical chamber |
ROTATION RACK & JIG SYSTEM | Satellite driving or central driving system |
POWER SUPPLIES |
DC Sputtering Power Supply: 2~4 sets Ion Source: 1 set |
DEPOSITION MATERIAL | Ta, Ti/Cr/TiAl, Au, Ag, Cu etc. |
DEPOSITION SOURCE | Planar Sputtering Cathodes + circular arc cathodes |
CONTROL | PLC(Programmable Logic Controller) + IPC ( manual+ auto+ semi-auto operation models) |
PUMP SYSTEM | Rotary Vane Pump: SV300B – 1 set (Leybold) |
Roots Pump: WAU1001 – 1 set (Leybold) | |
Holding Pump: D60C – 1 set (Leybold) | |
Magnetic Suspension Molecular Pump: MAG2200 – 2 sest (Leybold) |
|
GAS MASS FLOW CONTROLLER | 2 channels: Ar and N2 |
VACUUM GAUGE | Inficon or Leybold |
SAFETY SYSTEM | Numerous safety interlocks to protect operators and equipmen |
HEATING | Heaters: 20KW. Max. temp.: 450℃ |
COOLING | Industrial Chiller (Cold Water) |
POWER MAX. | 100KW (Approx.) |
AVERAGE POWER CONSUMPTION | 45 KW (Approx.) |
GROSS WEIGHT | T (Approx.) |
FOOT PRINT | ( L*W*H) 4000*4000 *3600 MM |
ELECTRICAL POWER |
AC 380V/3 phases/50HZ / 5 line |
Insite:
Built Time: 2018
Location: China
Please contact us for more applications and specifications.